X-ray Fluctuation Power Spectral Densities of Seyfert 1 Galaxies
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X-Ray Photoemission Spectrometry---XPS---X射线光电子光谱法X-Ray Diffraction---XRD---x射线衍射Ultraviolet photoemission spectroscopy--- UPS---紫外光电子能谱Vibrational spectroscopy---振动光谱Infrared Spectroscopy---IR---红外光谱Diffuse Reflectance Infrared Spectroscopy---DRIFTS--漫反射红外光谱Raman Spectroscopy---拉曼光谱High Resolution Electron Energy Loss Spectroscopy---(HREELS)---高分辨电子能量损失谱Electron Spin Resonance---(ESR)---电子自旋共振Temperature Programmed Desorption---(TPD)---程序升温Gas Chromatography---(GC)---气相色谱Mass Spectrometry---(MS)---质谱Ion-Molecule-Reaction Mass Spectrometry---(IMR-MS)---离子分子反应质谱Temperature Programmed Reaction---(TPR)---程序升温反应Secondary Ion Mass Spectrometry---(SIMS)---二次离子质谱Mossbauer Spectrometry---穆斯堡尔光谱Energy Dispersive Analysis of X-rays---(EDX)---分析能量色散X射线Scanning Electron Microscopy---SEM---扫描电子显微镜Transmission Electron Microscopy---TEM---透射电子显微镜Scanning Probe Microscopy---SPM---扫描探针显微镜Atomic Force Microscopy ---AFM---原子力显微镜,Scanning Tunneling Microscopy ---STM--- 扫描隧道显微镜Extended X-Ray Absorption Fine Structure Spectrometry---EXAFS---扩展X射线吸收精细结构光谱X-Ray Absorption Near Edge Structure---XANES---X射线吸收近边结构Low-energy Electron Diffraction---LEED---低能电子衍射仪,Reflection High-energy Electron Diffraction ---RHEED---反射高能电子衍射Brunner Emmett Teller Method---BET---比表面积法Nuclear Magnetic Resonance---NMR---核磁共振Ion Scattering Spectrometry---ISS---离子散射光谱法Atom force microscopy---AFM---原子压力显微镜Auger Electron Spectroscopy---AES---俄歇电子谱Thermogravimetry---TGA---热重分析Diff.Thermal Analysis---DTA---差热分析(注:专业文档是经验性极强的领域,无法思考和涵盖全面,素材和资料部分来自网络,供参考。
手性聚苯胺的制备及其电磁波吸收性能*黄艳,周祚万西南交通大学材料科学与工程学院,材料先进技术教育部重点实验室,成都(610031)E-mail:zwzhou@摘要:采用二次掺杂法制备了具有手征特性的聚苯胺,利用傅立叶红外光谱(FT-IR)、X 射线衍射仪(XRD)、圆二色谱仪(CD)和紫外-可见光分光光度计(UV-vis)等分析手段对聚苯胺的结构、性能和手征特性进行表征,结果表明,通过过硫酸铵作引发剂,盐酸掺杂获得了导电的盐酸掺杂态聚苯胺(PANI-HCl);通过氨水脱掺杂后得到本征态聚苯胺(EB),EB通过手性樟脑磺酸(CSA)诱导,形成手征性螺旋构型聚苯胺。
电磁性能测试表明,手性聚苯胺比非手性聚苯胺具有较优越的吸波性能。
关键词:聚苯胺;手征性;电磁学性能0.引言在众多的导电聚合物中,聚苯胺具有原料易得、结构和性能可控、合成简便、环境稳定性好等特点,是当前最具有应用前景的导电聚合物品种之一。
手性导电高聚物,又称手征合成金属,主要是指手性本征导电聚合物,是在手征高分子和导电高分子基础上发展起来的。
手性聚合物则是指聚合物本身或构象的不对称性而具有旋光性的高分子,引起带有不对称或含有带手性原子的基团而具有构型上的特异性,形成相对稳定的单向螺旋链的高聚物。
1985年Elsenbaumer等[1]人首次报道了手征导电的聚乙炔、聚吡咯。
在研究聚吡咯和聚噻吩中首先提出共轭高分子的手征性。
1994年Wallace课题组对手性聚苯胺展开了大量的研究工作。
随后许多研究者对手性聚苯胺的合成进行了广泛的研究,提出了原位掺杂、低聚物辅助、自组装、电化学等方法制备手性聚苯胺。
本文用二次掺杂法制备出手性聚苯胺,并对其结构、电磁学性能和吸波性能进行了系统的分析和讨论,对比研究手性聚苯胺与普通聚苯胺的电磁参数和吸波性能。
1.实验部分1.1 主要试剂及仪器苯胺(Aniline,AR,减压蒸馏,成都科龙化工试剂厂),过硫酸铵(APS,AR,成都科龙化工试剂厂),浓盐酸(AR,36~38%,成都金山化学试剂有限公司),氨水(AR,25~28%,成都金山化学试剂有限公司),樟脑磺酸(CSA,AR,上海康复赛尔医药科技有限公司),二甲亚砜(DMSO,AR,成都科龙化工试剂厂),N-N-二甲基甲酰胺(DMF,AR,成都科龙化工试剂厂),无水乙醇(AR,成都科龙化工试剂厂)。
XGT-9000XRF Analytical MicroscopeScreen, Check, Map and MeasureThe combination of elemental images and transmission images allows one to detect hidden defects.Large working distance and coaxial vertical optics provide a clear transmission image without the shadow effect in undulating electronic boards.with elemental image only)and identifiedLine profile of blue part What is the XGT-9000?Screen, check, map and measureThe XGT-9000 is an X-ray Fluorescence Analytical Microscope, which provides non-destructive elemental analysis of materials.Incident X-ray beam is guided towards thesample placed on the mapping stage.X-ray fluorescence spectrum and transmission X-ray intensity are recorded at each point.Information available: Qualitative & quantitative elemental analysis/Mapping/Hyperspectral imaging.123Optical image Elemental imagesTransmission image Elemental imagesTransmission imageTransmission imageFull spectrum at each pixelfil f blXYThe XGT-9000 can detect anddetermine the composition of foreign particles, and therefore track the source of contamination.X-ray Fluorescence photons can be partially absorbed by theencapsulated material and will not show in the spectrum. The X-ray transmission image provides a complete picture.XGT-9000 with a wide range of applicationsOptical imageTiCrFeX-ray backscatter imageX-ray transmission imageAu thicknessOptical imageMapping areaLayered imageAu patternThe combination of microbeam and thickness measurement capability makes the XGT-9000 a useful tool for the QC of semiconductors,which feature thin and narrow patterns. Thickness sensitivity depends on elements traced, but can be at the Angstrom level.Biological samples contain water or gas, and will be heavily modified or damaged if measured in a vacuum. 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DATA SHEETCoating Thickness Material AnalysisFISCHERSCOPE® X-RAY XDL® 210 FISCHERSCOPE® X-RAY XDL® 220 FISCHERSCOPE® X-RAY XDL® 230 FISCHERSCOPE® X-RAY XDL® 240X-ray fluorescence spectrometer for manual or automated coating thickness measurements on protective and decorative coatings, mass-produced parts and pc-boardsFISCHERSCOPE X-RAY2 FISCHERSCOPE X-RAY XDLDescriptionThe FISCHERSCOPE ®-X-RAY XDL ® instruments are universally applicable energy-dispersive x-ray spectrometers. They represent the next step in the development of the proven FISCHERSCOPE X-RAY XDL-B model series. Like their predecessors, they are particularly well suited for non-destructive thickness measurements and analysis of thin coatings, for measurements on mass-produced parts and pc-boards as well as for the solution analysis.A high count rate is achieved by using a proportional counter tube, which allows for precise measurements. Using the Fischer fundamental parameter method, coating systems as well as solid and liquid samples can be analyzed standard-free. It is possible to detect up to 24 elements in the range from chlorine (17) to uranium (92) simultaneously.The XDL x-ray spectrometers have an excellent long-term stability, which among other things is reflected in a significantly reduced calibration effort.The instruments of the XDL series are especially well suited for measurements in quality assurance, reception inspection and production monitoring. Typical areas of application are:∙ Measurement of electro-plated mass-produced parts ∙ Inspection of thin coatings, e.g., decorative chromium-plating ∙ Analysis of functional coatings in the electronics and semiconductor industries∙ Automated measurements, e.g., on pc-boards ∙Solution analysis in the electroplatingDesignThe FISCHERSCOPE X-RAY XDL spectrometers are designed as user-friendly bench-top instruments. According to the intended use, different versions are available with different support stages and with fixed or adjustable Z-axis. XDL 210: Plane support stage, fixed Z-axis XDL 220: Plane support stage, motor-driven Z-axis XDL 230: Manually operable X/Y stage, motor-driven Z-axisXDL 240: Motor-driven X/Y stage that moves into the loading position automatically, when the protective hood is opened. Motor-drivenZ-axis with two speedsA high-resolution color video camera with powerful magnification simplifies the precise determination of the measurement location and visualizes the measurement procedure in process. In models equipped with a X/Y stage a laser pointer serves as a positioning aid and supports the quick alignment of the sample to be measured.A gap in the housing allows for measurements on large flat specimens, which do not fit in the measuring chamber, e.g. large pc-boards.The entire operation, the evaluation of the measurement as well as the clear presentation of the measurement data is done on a PC using the powerful and user-friendly WinFTM ® software.XDL spectrometers are fully protected instruments with type approval according to the German regulations …Deutsche Röntgenverordnung-RöV“.XDL3General SpecificationsIntended use Energy dispersive x-ray fluorescence spectrometer (EDXRF) to determine thin coatings and for the solution analysis.Element range Chlorine Cl (17) to Uranium U (92) – up to 24 elements simultaneously DesignBench-top unit with hood opening upwards Measuring direction From top to bottomX-ray sourceX-ray source Tungsten tube with beryllium window High voltage Adjustable 30 kV, 40 kV, 50 kVAperture (collimator) Ø 0.3 mm (optional Ø 0.1 mm, Ø 0.2 mm, slot 0.3 mm x 0.05 mm)Measurement spotDepending on the measuring distance and on the aperture, the actual measurement spot size is shown in the video image.Smallest measurement spot: approx. Ø 0.16 mmMeasuring distance e.g., for measurements in recesses 0 ... 80 mm, in the non-calibrated range using the patented DCM method 0 ... 20 mm, in the calibrated range using the patented DCM methodX-ray detectionX-ray detector Proportional counterSample orientationVideo microscopeHigh-resolution CCD color camera for optical monitoring of the measurement location along the primary beam axis, manual focusing and auto-focus, crosshairs with a calibrated scale (ruler) and spot-indicator, adjustable LED illumination of the measurement locationZoom faktor 20x ... 180x (optical: 20x … 45x; digital: 1x, 2x, 3x, 4x)Sample support stageXDL 210 XDL 220 XDL 230 XDL 240 Design Fixed sample supportFixed sample support Manual X/Y-stage Programmable X/Y-stage Maximum travel X/Y - - 95 x 150 mm255 x 235 mm Travel speed X/Y- - - ≤ 80 mm/s Repeatability precision X/Y ---≤ 0,01 mm (*1) Usable sample placement area463 x 500 mm 463 x 500 mm 420 x 450 mm 300 x 350 mm Z-axis Fixed Position (Top/Middle/Bottom)Electrically adjustable Electricallyadjustable Electrically adjustable Travel Z-axis - 140 mm 140 mm 140 mm Max. sample mass 20 kg 20 kg 20 kg 5 kg / 20 kg (*2) Max. sample height155/90/25 mm140 mm140 mm140 mmLaser pointer to support accurate sample placement- Yes Yes Yes(*1) unidirectional (*2) with reduced approach travel precisionFISCHERSCOPE X-RAY XDLCoating Thickness Material Analysis Microhardness Material TestingElectrical dataLine voltage, line frequency AC 115 V or AC 230 V 50 / 60 Hz Power consumption Max. 120 W (measuring head without PC) Protection classIP40DimensionsExterior dimensions Width x depth x height [mm]: 570 x 760 x 650WeightXDL 210: 90 kg; XDL 220: 95 kg; XDL 230: 105 kg; XDL 240: 120 kg Interior dimensions measurement chamberWidth x depth x height [mm]: 460 x 495 x (see max. sample height)Environmental ConditionsTemperature: Operation 10 °C – 40 °C / 50 °F – 104 °F Temperature: Storage/Transport 0 °C – 50 °C / 32 °F – 122 °F Humidity of ambient air ≤ 95 %, non-condensingEvaluation unitComputer PC system with extension cards Software Fischer WinFTM ®StandardsCE conformity EN 61010X-ray standards DIN ISO 3497 and ASTM B 568ApprovalFully protected instrument with type approval according to the German regulations …Deutsche Röntgenverordnung-RöV“OrderFISCHERSCOPE X-RAY XDL 210 604-492 FISCHERSCOPE X-RAY XDL 220 604-494 FISCHERSCOPE X-RAY XDL 230604-496 FISCHERSCOPE X-RAY XDL 240604-498Helmut Fischer GmbH Institut für Elektronik und Messtechnik , 71069 Sindelfingen, Germany ,Tel.+4970313030,**********************Fischer Instrumentation (GB) Ltd, Lymington/Hampshire SO41 8JD, England ,Tel.+441590684100,*****************.uk Fischer Technology, Inc., Windsor, CT 06095, USA ,Tel.+18606830781,***************************Helmut Fischer AG , CH-6331 Hünenberg, Switzerland ,Tel.+41417850800,*****************************Fischer Instrumentation Electronique , 78180 Montigny le Bretonneux, France ,Tel.+33130580058,************************Helmut Fischer S.R.L., Tecnica di Misura, 20128 Milano, Italy ,Tel.+39022552626,***********************Fischer Instruments, S.A., 08018 Barcelona, Spain ,Tel.+34933097916,***********************Helmut Fischer Meettechniek B.V., 5627 GB Eindhoven, The Netherlands ,Tel.+31402482255,*****************************Fischer Instruments K.K., Saitama-ken 340-0012, Japan ,Tel.+81489293455,***********************Fischer Instrumentation (Far East) Ltd , Kwai Chung, N.T., Hong Kong ,Tel.+852********,**************************Fischer Instrumentation (S) Pte Ltd , Singapore 658065, Singapore ,Tel.+6562766776,***************************Nantong Fischer Instrumentation Ltd, Shanghai 200333, P.R. China ,Tel.+862132513131,***********************Fischer Measurement Technologies (India) Pvt. Ltd , Pune 411036, India ,Tel.+912026822065,***********************FISCHERSCOPE ®; XDL ®; WinFTM ® are registered trademarks of Helmut Fischer GmbH Institut für Elektronik und Messtechnik, Sindelfingen - Germany.951-062 12/09 05-09。
收稿日期:2020⁃09⁃29。
收修改稿日期:2020⁃12⁃28。
国家自然科学基金(No.21875037,51502036)和国家重点研发计划(No.2016YFB0302303,2019YFC1908203)资助。
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E⁃mail :***************.cn ,***************第37卷第3期2021年3月Vol.37No.3509⁃515无机化学学报CHINESE JOURNAL OF INORGANIC CHEMISTRYp 区金属氧化物Ga 2O 3和Sb 2O 3光催化降解盐酸四环素性能差异毛婧芸1黄毅玮2黄祝泉1刘欣萍1薛珲*,1肖荔人*,3(1福建师范大学环境科学与工程学院,福州350007)(2福建师范大学生命科学学院,福州350007)(3福建师范大学化学与材料学院,福州350007)摘要:对沉淀法合成的p 区金属氧化物Ga 2O 3和Sb 2O 3紫外光光催化降解盐酸四环素的性能进行了研究,讨论了制备条件对光催化性能的影响。
最佳制备条件下得到的Ga 2O 3⁃900和Sb 2O 3⁃500样品光催化性能存在巨大差异,通过X 射线粉末衍射、傅里叶红外光谱、N 2吸附-脱附测试、荧光光谱、拉曼光谱、电化学分析及活性物种捕获实验等对样品进行分析,研究二者光催化降解盐酸四环素的机理,揭示影响光催化性能差异的本质因素。
结果表明,Ga 2O 3和Sb 2O 3光催化性能差异主要归结于二者不同的电子和晶体结构、表面所含羟基数量及光催化降解机理。
关键词:p 区金属;氧化镓;氧化锑;光催化;盐酸四环素中图分类号:O643.36;O614.37+1;O614.53+1文献标识码:A文章编号:1001⁃4861(2021)03⁃0509⁃07DOI :10.11862/CJIC.2021.063Different Photocatalytic Performances for Tetracycline Hydrochloride Degradation of p ‑Block Metal Oxides Ga 2O 3and Sb 2O 3MAO Jing⁃Yun 1HUANG Yi⁃Wei 2HUANG Zhu⁃Quan 1LIU Xin⁃Ping 1XUE Hun *,1XIAO Li⁃Ren *,3(1College of Environmental Science and Engineering,Fujian Normal University,Fuzhou 350007,China )(2College of Life and Science,Fujian Normal University,Fuzhou 350007,China )(3College of Chemistry and Materials Science,Fujian Normal University,Fuzhou 350007,China )Abstract:The UV light photocatalytic performances of p ⁃block metal oxides Ga 2O 3and Sb 2O 3synthesized by a pre⁃cipitation method for the degradation of tetracycline hydrochloride were explored.The effects of synthesis conditions on the photocatalytic activity were discussed.The Ga 2O 3⁃900and Sb 2O 3⁃500samples prepared under optimal condi⁃tions exhibited a remarkable photocatalytic activity difference,which were characterized by X⁃ray diffraction,Fouri⁃er transform infrared spectroscopy,N 2adsorption⁃desorption tests,fluorescence spectrum,Raman spectrum,electro⁃chemical analysis and trapping experiment of active species.The photocatalytic degradation mechanisms of tetracy⁃cline hydrochloride over the photocatalysts were proposed and the essential factors influencing the difference of pho⁃tocatalytic performance were revealed.The results show that the different photocatalytic activities observed for Ga 2O 3and Sb 2O 3can be attributed to their different electronic and crystal structures,the amount of hydroxyl groupin the surface and the photocatalytic degradation mechanisms.Keywords:p ⁃block metal;Ga 2O 3;Sb 2O 3;photocatalysis;tetracycline hydrochloride无机化学学报第37卷0引言盐酸四环素(TC)作为一种四环素类广谱抗生素,被广泛应用于治疗人体疾病及预防畜禽、水产品的细菌性病害,其在世界范围的大量使用致使其在环境中积累[1]。