微波水热法合成TiO2以浸镀法制备抗眩玻

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微波水熱法合成TiO
2
以浸鍍法製備抗眩玻璃之研究*
A Study on Manufacturing Anti-glare Glass using Microwave
Synthesized TiO
2
and A Dip Coating Process*
1 1 1 1
H.C. Su1Y.N. Shieh1 C.Y. Cheng1S.K. Lai1
TiO2 (a) (b) 500 TiO2 SiO2 SEM AFM XRD UV-Vis
關鍵字: TiO2
The purpose of this study was to investigate the use of a microwave synthesis for TiO2 and a dip coating process to manufacture anti-glare glasses. The main advantages of microwave-hydrothermal processing of TiO2 are (a) rapid heating to a desired temperature and (b) extremely rapid kinetics for crystallization. The glass substrate was initially coated with a uniform layer of SiO2 particles with size ranging from 10 to 20-nanometer. A coating equipment was used to prepare a layer of anti-glare nano particles on the SiO2glass substrate. The anti-glare layer causes light scatting due to its rough surface morphology. The anti-glare solution is comprised of different nano particle sizes of TiO2 and SiO2. As the surface roughness increases, the scattering of light becomes significant thereby reducing the glare.
Key words: M icro-wave synthesis, anti-glare,dip
coating, TiO2
一、前 言
a. -
b.
MH MH
*
Paper presented at 2008 CIMME Annual Convention, October 23th, 2008, Taipei
1
Department of Materials and Engineering, Mingdao University
1. 2. 3.
二、浸鍍法
-1
-2
三、實驗方法
1. 前處理
2.54mm 76.2mm (1" 3")
1.0mm
(1)
(2)
(3)
(4)
(5)
(6)
2. 二氧化鈦溶膠製備
(1) 10M TiCl 800ml D.I water 400g D.I
water
(2) 1000ml D.I water NH4OH
PH7
(3) 2000ml D.I water 20
2000 ml D.I water
20
(4) 180ml 4000ml
D.I water 450W 20
3. 抗眩溶液製備
(1) 100ml SiO2 1620s 20wt%
100ml TiO2
TiO2/SiO2
(2) 200ml 4-Ethoxlated
Bisphenol-A Diacrylate BPA(4EO)DA
IPA -3 TiO
2
4. 抗眩膜製備
SiO 2 150mm/min 70
120mm/min 150mm/min UV 24
-1
No. (mm/min)
( )
(min)
a 1207030b
150
70
30
四、結果與討論
1. 微波水熱法合成二氧化鈦光學薄膜特性分析
1.1 XRD分析
-6 XRD MH d-lines 90% 6 MH MH
-4 UV -5
XRD 5500C Peak 25.53 anatas Peak 48.07 anatas 101 200 peak 27.93 rutile 110
TiO 2 anatase) rutile 101 TiO 2 anatase 1.2 SEM表面特徵分析
Scherrer equation Scherrer equation 3-50nm Scherrer equation -2
-2
(2 )
d (nm)TiO2-550 C
25.5
0.83
18.85 nm
-7 TiO 2 10~20 nm Scherrer equation -7 TiO 2
2. 抗眩薄膜特性分析
2.1 雷射光穿透實驗分析薄膜
-7 TiO 2 5500C SEM (a)
PureTiO 2 20 (b) PureTiO 2 5
-6 XRD
-8
a
0.2cm b
3cm
2.2 薄膜光譜分析
UV/VIS Spectrophotometer
-9
UV/VIS Spectrophotometer
-3
90%
120mm/min 150mm/min
64% 58%
150 mm/min
-3 UV
mm/min 7090105120150 90%70.01%67.30%67.10%64.16%58.62%
五、結 論
參考文獻
坽DEVries; Edward R., Flatting composition, U.S. patent 3865899
夌C. Euvananont,C. Junin, K. Inpor, P. Limthongkul, C. Thanachayanont, Ceramics International 34 (2008) 1067–1071
奅V. Musat, E. Fortunato, A.M. Botelho do Rego, R. Monteiro, Thin Solid Films 516 (2008) 1499–1502
妵W. Boysen, A. Frattini, N. Pellegri, O. de Sanctis, Surface and Coatings Technology 122 (1999) 14–17

Sridhar Komarneni, Rama K. Rajha, Hiroaki Katsuki, Materials Chemistry and Physics 61 (1999)
-8 a.
0.2cm b.
3cm
-9 UV/VIS Spectrophotometer。