全息平面投影屏像素层制作方法研究

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苏州大学硕士学位论文全息平面投影屏像素层制作方法研究姓名:周雷申请学位级别:硕士专业:光学工程指导教师:陈林森20080501全息平面投影屏像素层制作方法研究中文摘要全息平面投影屏像素层制作方法研究

中文摘要实现高亮度、高分辨、高色彩还原度的大屏幕投影显示系统是现代显示技术发展的一个重要方向。投影屏幕作为投影显示系统的核心部件之一,它的光学品质直接影响整个投影显示系统的性能。近年来,科研人员一直致力于研发在高亮度环境中仍然能获得高品质显示效果的投影屏幕。本文对大幅面投影屏幕进行了深入研究,提出了基于全息像素微结构的投影屏幕,并采用微纳米压印技术进行了制作,改进投影屏幕性能,完成了相关的实验和测试。本文的第一部分首先介绍了大屏幕投影显示系统的技术基础一光学投影显示技术和微纳光学元器件加工技术。其次对目前几种主流投影屏幕的光学结构及屏幕成像质量的评测参数做了介绍和分析,特别介绍了全息平面投影屏幕的国内外发展和研究现状。第二部分提出了一种制作平面投影屏幕全息像素层的新方法。总的来讲,所提出的方法基于散斑的像面全息,又可分为一步散斑像面全息和两步散斑像面全息两种方案。分别制作了两种设计方案下的全息像素光刻胶母版,对一步像面全息制作光路中狭缝的宽度对散斑再现像的影响进行了数值模拟研究。理论分析了全息像素光刻胶母版的色散情况。第三部分论述了制作大幅面全息像素层的微纳米压印技术。首先简述了微纳米压印技术的现状及发展趋势。其次着重针对本文所采用的数字微纳米压印技术及装备,详细介绍了该装备在软件、机械、电控等方面的技术特点,分析了压印图形的数字化生成、压力、温度等工艺参数对压印图形的光学性能的影响。最后利用该装备和技术制作出了全息像素层。本文第四部分采用CIE-1931色度图实际测量了实验制作的全息像素的色饱和度,分析了误差来源。同时给出了样品的视场和增益的测量结果,并进行了分析。结果表明所制作全息像素在增益、视角、色饱和度等光学特性皆有明显的改善。最后,对本研究课题进行了总结,并指出了新的工作方向。关键词:像面全息投影屏幕散斑微纳米压印微光学作者:周雷

指导教师:陈林森TheStudyofHolographicProjectionScreenandItsFabricationAbstract

TheStudyofHolographicProjectionScreenand

Its

Fabrication

AbstractLarge-screenprojectionsystemwiththecharacteristicsofhighbrightness,high

resolution,highcolorreproductionisveryattractiveforcommercial

applicationsand

opticalengineers.Asakeycomponent

inprojection

system,projection

screenplays

an

importantroleindetermining

image

qualityofthewhole

system,Recently,researchers

havebeencommittedtodevelopingvarious

typesofprojectionscreens,whichhave

high-qualityimageeveninhigh-brightnessenvironment.Thepaperis

focused

Oildesign

andfabricationoflarge·format

holographicprojection

screen.Holographiclithographyis

usedtoformthepixelshavingmicro—structurein

display

screenand

micro/nano.imprint

lithographyisusedtotransferthemicro·structuretoPolycarbonate.Methods

toimprove

performanceofthe

screenarediscussed,and

experimentalmeasurementresultsarealso

giveninthisthesis.

Firstly,large。screenprojectiondisplaysystembasedonoptical

projection

display

technologyandmicro-fabricationprocessingisintroduced.Comparingplanarholographic

projectionscreen

withseveralkindsof

screen

with

differentmicro.structure,thekey

parametersofevaluatingperformanceofprojectionimagearelistedandsummarizedin

thissection.Inthesecondchapter,anewandnovelmethodof

creatingprojectionscreenis

proposed,whichisbasedonthespeckleplanarhologramandnano—imprintlithography

technique.Twowaystoproducespeckleholographicmasteralepresentedindetail:one·stepimageplaneholographyand

two-stepimageplaneholography.Numerical

simulationresultestimatingtheperformanceofslotwidthinthe

setupisalso

given.

Inchapterthree,rnicro/nano。imprintlithographytechniqueasa

methodoffabricating

largeareaholographicprojectionscreenisdiscussed.Firstly,therecentprogressof

IITheStuayofHolographicProjectionScreenandItsFab..r....i..c—a—tio—n—

Abstraet

llano—imprintlithographyisoutlined.Secondly,themaintechnicalfeaturesofourdigital

imprintingequipmentaredemonstratedandmechanicalpart,softwareandelectronic

controlsectionale

describedindetail.Then,theinfluenceoftemperature,embossing

pressureon

theperformanceofsamplesisanalyzed.Finally,thelayercomposed

of

holographicpixelsisfabricated.Inthefonllchapter,thecolorsaturationoftheholographicpixelismeasuredby

the

CIE.193Ichromaticitydiagram,aswellasthefieldofviewandthegainoftheproposed

screen.Furthermore,thesourceoferrorisalsodemonstratedindetail.Theresultsshow

thatthegain,thefieldofviewandcolorreproductionareallsignificantlyimproved.

Finally,thesubjectofthisstudyweresummarized,and

pointed

out

whatCanbedone

inthefuturework.

Keywords:Imageplanehologram;Projectionscreen;Speckle;Nano-imprint;Micro-0ptits

IIIWrittenby:ZhouLei

Supervisedby:ChenLinse]n