基于相变材料Ge2Sb2Te5薄膜构造一种大面积完美吸收体和光学开关(英文)
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Ge_2Sb_2Te_5薄膜相变的内耗
胡大治;薛若时;吕笑梅;朱劲松
【期刊名称】《上海交通大学学报》
【年(卷),期】2010(0)5
【摘要】采用脉冲激光沉积法在Si衬底制备了Ge2Sb2Te5合金薄膜,利用双端夹持音频簧振动技术在kHz范围内研究其由相变所引起的内耗谱,并通过电阻率测量加以验证.结果表明:在Ge2Sb2Te5薄膜的非晶相到立方相、立方相到六方相转变的温度范围内,出现了与相变有关的内耗峰P1和P2,其峰位置与升温速率有关且满足Kissinger关系;内耗峰P1和P2的相变激活能分别为(1.91±0.19)和
(3.38±0.33)eV.
【总页数】4页(P662-664)
【关键词】Ge2Sb2Te5薄膜;相变;内耗
【作者】胡大治;薛若时;吕笑梅;朱劲松
【作者单位】南京大学固体微结构国家重点实验室
【正文语种】中文
【中图分类】O484
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1.千周和兆周范围的马氏体相变内耗以及预马氏体相变内耗 [J], 沈惠敏;许自然;朱劲松;杨照金;王业宁
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第49卷第12期人工晶体学报Vol.49No.12 2020年12月JOURNAL OF SYNTHETIC CRYSTALS December,2020相变存储器及其用于神经形态计算的研究综述杜玲玲,周细应,李晓(上海工程技术大学材料工程学院,上海201620)摘要:目前随着人工智能领域的兴起以及人们对数据存储和计算的强烈需求,迫切需要存储器的改进和类似于人脑的高效存储运算效率。
所以,相变存储器及其用于神经形态计算的研究是极具价值的。
相变存储材料(PCMs)受到激发时所产生的电阻值变化可以用来建立尖峰神经网络从而实现模拟神经形态计算系统。
本文介绍了相变存储器物理机制,其中包括相变材料的相变原理及主要性能特征,重点叙述了相变存储器在优化存储与计算方向的研究进展和应用,进而为该领域未来的发展方向提供参考。
关键词:相变存储器;相变材料;神经形态计算系统;相变突触/神经元中图分类号:TP333文献标识码:A文章编号:1000-985X(2020)12-239848Review of Phase Change Memory and Its Application inNeuromorphic ComputationDU Lingling,ZHOU Xiying,LI Xiao(School of Material Engineering,Shanghai University of Engineering Science,Shanghai201620,China)Abstract:With the rise of artificial intelligence and the explosive demand for data storage and computing,the improvement of memory and the efficient storage and computing efficiency similar to that of human brain are urgently needed.Therefore,it is necessary to study phase change memory and its application in neuromorphic computation.The change of resistance caused by the excitation of phase change materials( PCMs)can be used to build the spike neural network and realize the simulation of neural morphological computing system.This paper introduces the physical mechanism of phase change memory,including the phase change principle and main performance characteristics of phase change materials,and focuses on the research progress and application of phase change memory,so as to provide reference for the future development direction of this field.Key words:phase change memory;phase change material;neuromorphic computing system;phase change synapse/neuron0引言信息时代,人们对数据存储和计算的需求日益增长。
折射率是光在某种介质中传播时相对于真空光速的比值,通常用符号n表示。
对于化学式为Ge2Sb2Te5的化合物,其折射率随着光波长的变化而变化,这种现象被称为色散。
Ge2Sb2Te5是一种典型的相变材料,在相变过程中其折射率也会发生显著变化,这使得其在存储器等领域有着重要的应用价值。
下面将从不同角度详细介绍Ge2Sb2Te5的折射率特性。
1. 折射率与光波长的关系Ge2Sb2Te5的折射率随光波长的变化呈现出明显的色散效应。
一般来说,在可见光范围内,Ge2Sb2Te5的折射率随着光波长的增加而逐渐减小,这种现象与其电子结构和晶体结构密切相关。
通过对不同波长光的折射率进行测量和分析,可以揭示Ge2Sb2Te5材料的光学特性,为其在光存储等方面的应用提供基础数据支持。
2. 折射率与温度的关系由于Ge2Sb2Te5是一种相变材料,其折射率与温度之间存在着密切的关系。
在相变温度附近,Ge2Sb2Te5的折射率会发生剧烈变化,这一特性被广泛应用于光存储器件中。
通过研究不同温度下Ge2Sb2Te5的折射率变化规律,可以深入理解其相变机制和光学性能,为相变存储器的设计和优化提供重要依据。
3. 折射率与厚度的关系在实际应用中,Ge2Sb2Te5常常以薄膜形式存在,其厚度对其折射率也会产生影响。
随着薄膜厚度的增加,Ge2Sb2Te5的折射率可能会发生变化,这一特性对其在光存储器等领域的应用具有重要意义。
因此,研究不同厚度Ge2Sb2Te5薄膜的折射率特性,可以为薄膜存储器件的设计与制备提供指导。
4. 折射率与光学性能的关系Ge2Sb2Te5的折射率特性直接影响着其光学性能,如反射、透射等。
研究其折射率对光学性能的影响,有助于深入理解其光学行为,并为其在光存储器件、相变存储器等方面的应用提供理论基础。
总的来说,Ge2Sb2Te5的折射率特性是其作为相变材料和光存储器件中的重要应用基础之一。
通过对其折射率与光波长、温度、厚度等参数之间复杂关系的深入研究,可以全面了解其光学特性,为其在信息存储、光通信等领域的应用提供科学依据。
N-Ge2Sb2Te5薄膜的相变特性研究刘巧丽;刘军伟;李春波;李廷取;路大勇【期刊名称】《吉林化工学院学报》【年(卷),期】2016(033)003【摘要】采用射频磁控溅射法在室温下沉积了N-GST相变薄膜,利用原位XRD研究了其相变过程.结果表明:室温下沉积薄膜均为非晶态,且在室温~375℃温度范围内,纯GST薄膜发生了非晶态→立方晶态→六方晶态相转变;然而,当N2流量为12.8 sccm时,N掺杂GST薄膜则发生了非晶态→六方晶态直接相转变.此外,通过原位XRD确定结晶温度,表明N引入能够显著提高GST薄膜的结晶温度,这有利于提高相变薄膜的非晶热稳定性.【总页数】3页(P80-82)【作者】刘巧丽;刘军伟;李春波;李廷取;路大勇【作者单位】吉林化工学院材料科学与工程学院,吉林吉林132022;吉林化工学院材料科学与工程研究中心,吉林吉林132022;吉林化工学院材料科学与工程学院,吉林吉林132022;吉林化工学院材料科学与工程学院,吉林吉林132022;吉林化工学院材料科学与工程学院,吉林吉林132022;吉林化工学院材料科学与工程学院,吉林吉林132022;吉林化工学院材料科学与工程研究中心,吉林吉林132022【正文语种】中文【中图分类】O614.23【相关文献】1.采用泵浦探测技术研究VO2薄膜相变特性 [J], 侯典心;路远;冯云松;豆贤安;刘志伟2.MBE技术蓝宝石衬底上生长VO2薄膜及其太赫兹和金属-绝缘体相变特性研究[J], 孙洪君;王敏焕;边继明;苗丽华;章俞之;骆英民3.高质量外延VO2薄膜制备及其金属-绝缘体相变特性研究 [J], 唐志武;徐马记;陶欣;黎明锴;何云斌4.沉积氧压对二氧化钒薄膜结构、光电性能及其MIT相变特性的影响研究 [J], 陶欣;陆浩;李派;卢寅梅;何云斌;5.基于泵浦探针法研究VO2薄膜多波段红外激光相变特性 [J], 刘志伟;路远;冯云松;胡杰;刘瑞煌因版权原因,仅展示原文概要,查看原文内容请购买。
Sn掺杂Ge-Sb-Te相变薄膜的晶化特性
顾四朋;侯立松;赵启涛
【期刊名称】《材料研究学报》
【年(卷),期】2004(18)2
【摘要】用磁控溅射法制备了掺杂Sn的Ge_2Sb_2Te_5相变材料薄膜,研究了Sn 含量对结晶性能的影响.薄膜的X射线衍射(XRD)表明,热处理使薄膜发生了从非晶态到晶态的相变,并出现Sn-Te相.通过示差扫描量热(DSC)实验测出在不同加热速率下非晶态薄膜粉末的结晶峰温度,计算了材料的结晶活化能.根据结晶动力学分析和结晶活化能数据,掺杂Sn后的Ge-Sb-Te具有更高的结晶速率,用于光存储时将具有更高的擦除速度.
【总页数】6页(P181-186)
【关键词】无机非金属材料,;Ge2Sb2Te5,Sn掺杂,热致相变,结晶活化能
【作者】顾四朋;侯立松;赵启涛
【作者单位】中国科学院上海光学精密机械研究所
【正文语种】中文
【中图分类】TB321
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(19)中华人民共和国国家知识产权局(12)发明专利申请(10)申请公布号 (43)申请公布日 (21)申请号 201910376386.9(22)申请日 2019.05.07(71)申请人 东南大学地址 210096 江苏省南京市玄武区四牌楼2号(72)发明人 瑞光浩 丁传传 顾兵 崔一平 詹其文 甘巧强 (74)专利代理机构 南京众联专利代理有限公司32206代理人 张伟(51)Int.Cl.H01L 27/24(2006.01)H01L 45/00(2006.01)G02F 1/00(2006.01)G02F 1/01(2006.01)(54)发明名称一种基于Ge 2Sb 2Te 5相变材料的可重构显示装置及方法(57)摘要本发明公开了一种基于Ge2Sb2Te5(GST)相变材料的可重构显示装置,该装置由周期性像素单元组成,每个像素单元由纳米铝盘阵列、二氧化硅薄膜、GST层、铝衬底和外部控制电极系统构成。
该装置在GST薄膜上制备周期性的纳米铝盘阵列,通过调整纳米铝盘阵列的直径和周期可改变器件的整体反射谱,从而使得每个像素单元显示出不同的颜色。
此外,利用外部控制电极系统可对每个像素单元的GST薄膜加温并使其处于晶态和非晶态之间的特定状态,实现对显示颜色的动态可重构调控。
与现有的利用相变材料制作的显示装置相比,本发明具有色域广、分辨率高、能耗低、响应速度快和效率高等优势。
权利要求书1页 说明书4页 附图3页CN 110148609 A 2019.08.20C N 110148609A权 利 要 求 书1/1页CN 110148609 A1.一种基于Ge2Sb2Te5相变材料的可重构显示装置,其特征在于:由周期性像素单元(1)组成,每个像素单元包括:纳米铝盘阵列(2)、上层二氧化硅薄膜(3)、GST层(4)、下层二氧化硅薄膜(5)、铝衬底(6)、外部控制电极系统(7);所述的纳米铝盘阵列(2)、上层二氧化硅薄膜(3)、GST层(4)、下层二氧化硅薄膜(5)、铝衬底(6)从上至下依次分布,所述外部控制电极系统(7)可对上层二氧化硅薄膜(3)和下层二氧化硅薄膜(5)的电极输入电信号,用于GST层(4)的加温,从而实现GST材料由非晶态向晶态的转化。
March 2016 | Vol.59 No.3165 Published online 25 March 2016 | doi: 10.1007/s40843-016-0129-7Sci China Mater 2016, 59(3): 165–172SPECIAL ISSUE: Emerging Investigators of NanomaterialsA large scale perfect absorber and optical switchbased on phase change material (Ge 2Sb 2Te 5) thin filmXinglin Wen 1 and Qihua Xiong 1,2*1Division of Physics and Applied Physics, School of Physical and Mathematical Sciences, Nanyang Technological University, Singapore 637371, Singa-pore 2NOVITAS, Nanoelectronics Centre of Excellence, School of Electrical and Electronic Engineering, Nanyang Technological University, Singapore 639798, Singapore *Corresponding author (email: Qihua@.sg)FP resonator has been widely used to improve the perfor-mance of optoelectronic and photonic devices by placing those devices inside the cavity [5−9]. One drawback of the FP resonator is that its performance is highly sensitive to the incidence angle because a minor angle var iation will lead to a consider able wave path difference in that thick dielectric layer. In addition, for the solar energy conversion applications, the multilayer str uctur e is too thick to effi-ciently extract the carriers [10]. A thinner layer is preferred in the solar cell devices. However, light absorption of thin layer s is insufficient. In or der to over come this tr ade-off constraint, researchers are trying to enhance the light ab-sorption in an ultrathin film. It has been demonstrated that an ultrathin lossy material film can be utilized to achieve high absorption because of the interference effect [11−16]. The reason why the thin layer with thickness less than a quar ter wavelength can sustain a destr uctive interference is that the reflection on the interface between a lossy layer and a metallic film is non-trivial (Fig. 1a). For instance, a vanadium dioxide (VO 2) thin film absor ber was demon-strated with high absorbance at 11.6 μm [12]. The draw-back is that the phase of VO 2 depends on temperature in real time, so that one has to maintain a certain tempera-ture of the sample to achieve a high absorbance, indicating that the device is volatile. Furthermore, the VO 2 absorber cannot function within visible-near infrared range, where most solar cell devices absor b. Alter native mater ials or structures are demanded which can operate in visible-near infrared range for energy har vesting applications. Herein we have exper imentally demonstr ated a per fect absor ber with nearly 100% absor ption within visible-near infrared range by simply coating a phase change material Ge 2Sb 2Te 5 (GST) thin film onto a r eflecting metallic layer. We alsoABSTRACT In the conventional optical coating, the minimum thickness required to achieve anti-reflection should be quarter wavelength (λ/4n , where n is the refractive index). However, it was demonstrated that a lossy thin film with the thickness below quarter wavelength can also sustain the interference effect leading to a high absorption close to unity. In this paper we show that by depositing a phase change material Ge 2Sb 2Te 5 (GST) thin film (amorphous) on a metal reflector, unity ab-sorption is attainable. We attribute the high absorption to the interference effect within the GST thin film even though its thickness is less than a quarter wavelength. The wavelength of the absorption peak can be tuned by adjusting the GST film thickness. In addition, the performance of this perfect absorber is insensitive to the incidence angle variation. Relying on the fact that GST is a phase change material, the absorption band can be tuned by inducing the phase transition of GST. The huge difference of the reflectivity between amorphous and crystalline phase leads to a high optical contrast ratio as high as 400 at the specific wavelength, suggesting the potential in the application of optical switch and rewritable data storage.Keywords: lossy thin film interference, optical switch, perfect absorber, phase change materialINTRODUCTIONDriven by research in solar energy harvesting, perfect ab-sorber has received tremendous attention in the past few years [1,2]. The high absor ption can greatly enhance the efficiency of solar energy conversion. Conventionally, Fab-ry-Pérot (FP) cavity is a good geometry to achieve high ab-sor ption by utilizing the interference effect. Usually a FP cavity comprises of a metallic substrate serving as a reflec-tor and a dielectric layer with a quarter wavelength thick-ness within which the optical phase accumulates gradually to render the constructive or destructive interference [3,4].166March 2016 | Vol.59 No.3investigated the absor ption per for mance by var ying thethickness of GST and incidence angles.Apart from increasing the absorption efficiency in so-lar cell devices, perfect absorber can also be used in mod-ulator s or optical switches to enhance their per for mance [3,4,17]. In the application of modulator or switch, a con-sider able contr ast r atio is obtained by changing the r e-flection or transmission amplitude. A common and con-ventional method to change the r eflection/tr ansmission amplitude is to make the optical signal pass through a ma-terial with tunable refractive index and absorption coeffi-cient. A phase change mater ial or other mater ials whose property can be tuned with optical or electric stimuli are commonly used in the modulator or switch [18−20]. In the conventional method solely r elying on a single mater ial, a relative large change in refractive index or a large mate-rial thickness is required to achieve significant amplitude change. It is demanded to obtain a promising optical con-trast with a ver y thin device to make it convenient to be integrated to a circuit. By utilizing the inte r ference effect inside a thin phase change material, it is feasible to create high contrast within a ver y thin layer, especially near the perfect absorption wavelength with nearly zero reflection. In this paper, in addition to the perfect absorption of the amorphous GST thin layer, we also explore the absorption per for mance of GST under different phases and demon-strate that the absorption band is tunable. The results show that the contrast ratio between amorphous and crystalline GST can be as large as 400, suggesting the huge potential in the application of modulators and switches.EXPERIMENT DETAILSThin film depositionBefor e film deposition, glass substr ate was cleaned and then treated with oxygen plasma. 2 nm Cr adhesion layer and 150 nm Au (or Ag) film were deposited on glass with ther mal evapor ator (Elite Engeneer ing, Singapor e). The deposition rates of Cr and Au were 0.2 and 0.4 Å s −1. GST thin film was deposited on top of metal film directly witha magneton sputterring system (Semicore TriAxis) and the deposition rate was around 7 nm min −1 by applying the ra-dio frequency (RF) current with the power of 50 W . GST thickness was controlled by adjusting the depositing time.Reflectivity measurementThe absolute reflectivity was measured on a UV/vis/near inf r a r ed r adiation (NIR) spect r omete r (Pe r kinElme r L ambda 950). Lambda 950 can split the source beam into two identical beams, namely, reference beam and sample beam. The reference beam was taken as the reference signal so that the outcome was absolute reflectivity. Because there is no transmission of the sample, the absolute absorption can be obtained by deducting r eflectivity fr om incident light.RESULTS AND DISCUSSIONSAs shown in the cartoon in Fig. 1b, a metal layer (Au or Ag) and a GST layer were sequentially deposited on glass substrates. 150 nm Au or Ag layer was deposited by using ther mal evapor ation with the r ate of 0.4 Å s −1. The GST layer was deposited using a magnetron sputter with a depo-sition rate of 7 nm min −1 by applying a RF current with a power of 50 W . The as-deposited GST film is amorphous. Fig. 1a shows how light is reflected and refr acted in this lossy thin film.Ger manium-antimony-tellur ium (GeSbTe) system is a typical phase change material and can be switched between amor phous and cr ystalline phases. The phase tr ansition can be induced by heating or laser ir radiation. Benefited fr om the shor t r ecr ystallization time and the r eflectivity difference of different phases, GeSbTe materials have been widely used in rewr itable optical discs and phase change memory [21,22].Beyond the application in data stor age, GeSbTe could also be used as a space layer to constr uct metamater ials absorber [23]. Recently, a GeSbTe thin film based display was demonstr ated by sandwiching the GeSbTe film with transparent electrodes indium tin oxide (ITO) [24]. In thispaper, GST thin film was selected to construct a thin filmGlassAu or Ag Ge 2Sb 2T e 5(b)(a)Lossy material h <<Ȝ/4nr 0r 1r 2r 3MetalFigure 1 (a) Interference in ultrathin lossy material thin film. The reflection on the interface is non-trivial. (b) Schematic of the structure of GST ab-sorber.March 2016 | Vol.59 No.3167perfect absorber. Based on the dielectric function of amor-phous GST as shown experimentally in [25], the imaginary part ε2(w ) is about 5−15 in the entire visible-near infrared range, which indicates that GST is lossy in visible-near in-frared and meets the requirements to construct an ultra-thin film perfect absorber. Au (or Ag) with 150 nm thick-ness can block the transmission of light and was deposited on glass to serve as a reflector. We varied the thickness of GST from 10 to 70 nm by controlling the sputtering time and then measured the absolute reflectivity of these sam-ples with a UV/Vis/NIR spectrometer under a two-beam configuration. The light which was not reflected was ab-sorbed by the whole structure because there was no trans-mission allowed, so that the absorption performance can be evaluated by measuring the absolute reflectivity.Fig. 2a shows the reflectivity when using Au film as the reflector. The black curve shows the intrinsic absorption of the bare 150 nm Au film in the range from 300 to 2100 nm. It can be seen that the Au film will reflect 95% of the light with wavelength larger than 600 nm and the large absorp-tion below 600 nm is due to the inter transition band of Au. After adding a 10 nm GST layer on Au film, the reflectivity drops dramatically and its minimum reflectivity is 11.5% at 524 nm wavelength. Apart from the reflection, the rest of the light is absor bed because there is no tr ansmission of light through that thick Au film. The reflection dip red shifts and the minimum reflectivity drops further with the increasing thickness of GST films. When the GST thick-ness increases to 28, 42, 49 nm, the minimum reflectivity is 2.2%, 1.0%, 0.2% at the wavelength of 692, 816, 853 nm, respectively. From the data we can see that the thickness is less than quarter wavelength, for example when the GST is 28 nm thick, h ≈ λ/11n , n of GST film is about 2.2 at 692 nm [26]. To the best of our knowledge, the 99.8% absorption in 49 nm GST/Au is the highest among the thin film based ab-sorbers such as Ge/Au [11], Ge/SiO 2/Au [13] and VO 2/sap-phire [12] absorber. From Fig. 2a we can also find that most of the light is absorbed by the GST film while not the Au film, for instance, in the 49 nm GST absorber, at the wave-length of 853 nm, almost 95.0% of the incidence light is absorbed within the GST film while only 5.0% is absorbed by the Au film. The large absorption within the GST film is a great advantage of this kind of thin film absorbers and highlights the potential that most of the light can be ab-sorbed by the semiconductor layer if we apply the thin film absorber to a solar cell device. Fig. 2a also shows that the absorption band depends on the thickness of GST, which allows us to obtain high absorbance in visible-NIR range by var ying the thickness. Moreover, the absorption band, namely the width of the reflectance dip, is quite broad. For example, in the 49 nm GST case, the width of absorption band with absorption above 90.0% is around 200 nm, from 736 to 936 nm. We also used the Ag film as the reflector as shown in Fig. 2b, the absorption performance is similar to the Au film reflector and the absorption is as high as 99.3% at 784 nm wavelength for 28 nm GST on 150 nm Ag film. One advantage of Ag film over Au film is that the intrinsic absorption of Ag in entire visible range is quite small (black line, Fig. 2b), so that we can eliminate the absorption ef-fects of the metal film and most the visible light is absorbed by GST film.The reason why a thin GST film with thickness less than a quarter wavelength can support the interference effect is that the phase variation on the interface between GST and Au (or air) is non-trivial. Based on the Fresnel reflectioncoefficient r 12 = (n ~1−n ~2)/(n ~1+n ~2), where n ~ = n + ik is the complex r efr active index and the light encounter s medi-um 2 fr om medium 1, the r eflection on a gener al inter -face (n >>k ), the phase variation is π or 0, while the phase variation is no longer π or 0, when one side is a lossy layer (with n ~k ). Consequently, inter fer ence condition can be met even though the thickness is less than a quarter wave-ba0153045607590R e f l e c t i v i t y (%)Wavelength (nm)R e f l e c t i v i t y (%)Wavelength (nm)Figure 2 Absolute reflectivity of GST thin absorber. (a) Reflectivity of GST layer with different thickness on 150 nm Au. (b) Reflectivity of GST layer with different thickness on 150 nm Ag.168March 2016 | Vol.59 No.3length. Because the GST film is very thin, as a result, the phase accumulation of light propagating within the GST is quite small, which indicates that the absorber performance is not sensitive to the change of the incidence angle.Fig. 3a shows the angle dependent reflectivity of 42 nm GST on 150 nm Au from 8° to 65°. The reflectivity min-imum of each incidence angle was extr acted and shown in Fig. 3b. The r eflectivity minimum almost r emain un-changed with the incidence angle below 30° and it increas-es when the angle is larger than 30°. However, the reflec-tivity minimum remains in relatively low value within the range from 0−55°. Figs 3c and d plot the reflectivity and the minimum reflectivity versus incidence angle, respectively, for the case of 28 nm GST on 150 nm Ag. The performance is similar to the case where Au was used as the reflector. The GST thin film based absorber can perform well within a broad incidence angle, which is a great advantage over the conventional FP resonator and exhibits advantages for solar harvesting applications.The r esults of the amor phous GST film ar e shown in Figs 2 and 3. It is interesting to examine the performance of the absorber after inducing the phase transition, making it possible to obtain an absorber with tunable absorptionband. The phase transition of GST is induced by heating the sample with a rapid annealing process. As expected, the sample is annealed at 170°C for 10 min to make it transit from amorphous to rock salt structure, and subsequently, further 10 min annealing at 380°C makes it transit to hex-agonal structure. The phase of GST is confirmed by X-ray diffraction (XRD) and Raman measurement as shown in Fig. 4.Fig. 4a shows the XRD of the as-deposited film, after 170°C and 380°C annealing r espectively. No XRD peaks can be detected under room temperature, suggesting that the as-deposited film is amorphous. Based on the assigned XRD peaks as r epor ted in the liter atur e, the XRD peaks confirm that the film is in rock salt structure after 170°C annealing and hexagonal str uctur e after 380°C anneal-ing [27]. Fur ther mor e, we measur ed the Raman scatter -ing signal of the GST film at different phases as shown in Fig. 4b. The Raman measurement was conducted on the Horiba JYT 64000 spectrometer under backscattering ge-ometry with a 0.24 mW 532 nm laser excitation, and the laser power was minimized to avoid laser heating. Two vi-brational modes with the Raman shift of 123 and 140 cm −1 at the room temperature were also obser ved in the sput-30060090012001500180021000153045607590R e f l e c t i v i t y (%)Wavelength (nm)8° 15° 20° 25° 30° 35° 40° 45° 50° 55° 60° 65°a30060090012001500180021000153045607590R e f l e c t i v i t y (%)Wavelength (nm)8° 15° 20° 25° 30° 35° 40°45° 50° 55° 60° 65°cb 0246810121416R m i n (%)R m i n (%)șincidence (°)d 0246810121416șincidence (°)Figure 3 Reflectivity versus incidence angle. (a) Reflectivity of 42 nm GST on 150 nm Au with different incidence angle. (b) Extracted reflectivity mini-mum in each incidence angle corresponding to (a). (c) Reflectivity of 28 nm GST on 150 nm Ag with different incidence angle. (d) Extracted reflectivity minimum in each incidence angle corresponding to (c).March 2016 | Vol.59 No.3169tering GST film by other researcher, which were assigned A 1 mode of GeTe 4 tetrahedral and A 1 mode of disordered helical Te chains, respectively [28]. Based on the first prin-ciple calculations, the feature at 54 cm −1 shift is the E g mode of the hexagonal structure and the 173 cm −1 shift is the A 1g mode of the hexagonal structure, suggesting that the GST is in the hexagonal structure after 380o C annealing [29]. In a word, the GST thin film was deposited by a sputter ing system and the phase transition can be triggered by heat-ing. The XRD and Raman measurement confirm that the transition from amorphous to rock salt and further to hex-agonal structure indeed occurs upon heating at 170°C and 380°C, respectively.We measured the reflectivity of the amorphous and crys-talline GST thin film on 150 nm Au substrate to evaluate the phase transition effects on the absorber performance. In our case, 380°C high temperature annealing will destroy the film of small thickness, so that we cannot evaluate the performance of hexagonal GST, and the cr ystalline phase in following main text refers to the rock salt structure after 170o C annealing.The r eflectivity with amor phous and cr ystalline GST on 150 nm Au substrate is shown in Fig. 5a (absorber with other GST thickness are not shown here). It can be clearly seen that the reflectivity changes significantly after induc-ing a phase transition, suggesting the GST based absorber has the potential to be used as a tunable absorber. For in-stance, 70 nm amorphous GST absorber has a ver y poor absor ption. However, 70 nm cr ystalline GST has a unity absorption at the wavelength of 1422 nm and the absorp-tion band is broad. 49 nm amorphous GST absorber has a unity absorption at 853 nm, while the absorption is reducedafter inducing the phase transition to the crystalline phase. Qualitatively, we attr ibute the large reflectivity difference to the change of the complex refractive index of GST af-ter phase transition, based on Fresnel equation, the phase variation on the interface will change if the complex refrac-tive index of GST is altered. The contrast ratio is defined by the equation contrast = (R crystalline − R amorphous )/R amorphous or (R amorphous −R crystalline )/R crystalline based on which phase has the lower reflectivity. The contrast of thin film absorber with various GST thickness is plotted on Fig. 5b. The equation shows that the maximum contr ast r atio is highly depen-dent on the minimum value of the reflectivity. A near zero reflectivity will give a very high contrast ratio. The contrast is as high as 400 under the thickness of 70 nm, and the contrast of other thickness are also pronounced. It has been reported that the combination of GST and metamaterials gave a contrast ratio of 4 and the GST based display had the contrast of 4 [24,30].It has been demonstrated that a 20% reflectivity contrast of a pure GST thin film can be achieved to the data storage [17]. It has also been reported that a silicon cased modu-lator with the ratio of 2.5:1 is sufficient for the data pro-cessing [31]. The highest contrast ratio we obtain here is much higher than what reported in literature, which arises from the near zero reflectivity at the specific wavelength. Fig. 5b shows that the high contrast ratio operation wave-length can be tuned by changing the GST thickness. In ad-dition, the structure is fabricated by sputtering system and the GST thin film is uniform in wafer scale, so that we can achieve the per fect absor ption and high contrast ratio in large scale. The high contrast, large scale and convenient fabr ication method highlight the advantages of the GST25303540455055380°C annealing170°C annealingI n t e n s i t y (a .u .)2ș (°)As-deposited (200)(220)(103)(106)(210)(203)a50100150200250300380°C annealing170°C annealingAs-deposited66I n t e n s i t y (a .u .)Raman shift (cm í1)54123140173b____Figure 4 Phase transition of GST film. (a) XRD of the thin film at room temperature (as-deposited), after 170°C annealing and after 380°C annealing. (b) Raman signal of the as-deposited and annealed film.170March 2016 | Vol.59 No.3thin film based absorber and optical switch.CONCLUSIONSIn summar y, a GST thin film per fect absor ber has been demonstrated by utilizing the non-trivial reflection on the interface. The absorption can reach unity at the resonantwavelength and the absorption band can be tuned over vis-ible-NIR range by var ying the thickness of GST. The ab-sorber can perform well in a broad incidence angle range and the absorption is prominent even the incidence angle is as large as 55°. More impor tantly, the optical proper ty change of GST during the phase transition can be utilized4008001200160020000510152025C o n t r a s t r a t i o Wavelength (nm)42 nm GST400800120016002000020*********C o n t r a s t r a t i oWavelength (nm)49 nm GST4008001200160020003691215C o n t r a s t r a t i oWavelength (nm)56 nm GST400800120016002000100200300400C o n t r a s t r a t i oWavelength (nm)70 nm GSTbaR e f l e c t i v i t yWavelength (nm)400800120016002000R e f l e c t i v i t yWavelength (nm)020*********R e f l e c t i v i t yWavelength (nm)20406080100R e f l e c t i v i t yWavelength (nm)Figure 5 (a) Reflectivity of thin film absorber with amorphous and crystalline GST on 150 nm Au film, 70, 56, 49 and 42 nm thick GST are shown respectively. 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Wen X conducted the experiments. Xiong Q and Wen X wrote the paper. All authors contributed to the general discussion.Conflict of interest The authors declare that they have no conflict of interest.March 2016 | Vol.59 No.3171。