当前位置:文档之家› Fabrication, Characterization, and Analysis of a DRIE CMOS-MEMS Gyroscope

Fabrication, Characterization, and Analysis of a DRIE CMOS-MEMS Gyroscope

Fabrication, Characterization, and Analysis of a DRIE CMOS-MEMS Gyroscope
Fabrication, Characterization, and Analysis of a DRIE CMOS-MEMS Gyroscope

Fabrication,Characterization,and Analysis of a DRIE CMOS-MEMS Gyroscope

Huikai Xie and Gary K.Fedder

Abstract—A gyroscope with a measured noise floor of

0.02s/Hz1

1

1.

isolation trench technique has also been used to fabricate single-crystal silicon(SCS)gyroscopes[17],[18],but the degree of CMOS-compatibility and design flexibility are still concerns.

In this paper,we present a lateral-axis vibratory gyroscope that has both single-crystal silicon(SCS)microstructures and full https://www.doczj.com/doc/ea13812779.html,pared to the existing gyro-scopes,the reported gyroscope is fabricated using a unique DRIE CMOS-MEMS process[3].It integrates single-crystal silicon based-sensor structures,CMOS circuits,thin

beams

m

-axis gyroscopes have been extensively

fabricated using both in-plane actuation and sensing,this work

is focused on the feasibility to realize lateral-axis gyroscope

using out-of-plane sensing.Then monolithic three-axis inte-

grated gyroscopes can be achieved.

First,the fabrication process and its unique vertical-axis

sensing/actuation capability are introduced.Next,two possible

gyroscope topology designs with vertical sensing or actuation

are compared and evaluated by using a simplified three-di-

mensional(3-D)comb-drive model.Then,a finite-element

simulation is performed on the chosen topology design.Next,

the fabrication and characterization of the device are discussed.

II.DRIE S ILICON CMOS-MEMS P ROCESS

The DRIE silicon post-CMOS micromachining process flow

and a fabricated example microstructure are shown in Fig.1.

First,a backside DRIE silicon etch is performed[Fig.1(a)(i)].

This backside etch step thins the silicon layer to between

50to

80-

-axis compliant springs,as shown in

Fig.2(b).

III.G YROSCOPE D ESIGN

When a structure is vibrating in a rotating reference frame,

a Coriolis acceleration arises and is proportional to the rotation

rate and the vibration

velocity,

i.e.

-axis motion of the rotor finger,resulting in a differential

capacitive divider.The silicon layer is used as a mechanical sup-

port.

of Group B increase while the bottom capacitor

(a)

(b)

Fig.3.Z -axis sensing principle.(a)Differential sidewall capacitive bridge.(b)Sidewall capacitance offset cancellation (SCS layer is not

shown).

Fig.4.

Combined x -axis/z -axis actuation principle.

and bottom electrodes of Group A are,respectively,connected to the bottom and top electrodes of Group B,then

increasing

,and

decreasing are grouped together,

respectively,to form a capacitive bridge.Since each branch of the bridge has a top capacitor and a bottom capacitor,the sum of the capacitances of each branch is equal at the rest position,

i.e.,

.The operational principle

of

-axis/

-axis force is generated

when a voltage

(e.g.,

).When the same

voltage (i.e.,

-axis actuation range is limited

(a)

(b)

https://www.doczj.com/doc/ea13812779.html,parison of vertical sensing and vertical actuation.

B.Choosing Between Vertical Actuation and Sensing Lateral-axis gyroscopes must implement either vertical sensing or vertical actuation,according to (1).Topologies representative of the two alternatives are shown in Fig.5.For the vertical sensing topology [Fig.5(a)],an SCS proof mass is centered inside a rigid SCS frame through four groups of z-compliant,thin-film spring beams.So,

a

-axis SCS drive springs.Upon operation,the

SCS frame together with

the

-axis and

an

-axis accelerometer vibrates in

the

axis or any arbitrary

direction in

the

-axis actuation

and

-axis force produces

a

-axis accelerometer to this undesired vibration,

the

-axis.The topology shown in Fig.5(b)employs

https://www.doczj.com/doc/ea13812779.html,b finger model for 3-D electrostatic force analysis.

will cause a

small

-axis.

Lateral spring beams have silicon underneath,and thus they are flat and have good comb-finger alignment and high stiffness

ratio between

the

and .Coordinate set

(

)in Fig.5.For

this first-order analysis,the parallel-plate approximation is used and fringing effects are ignored.The capacitance of the comb finger is

then

-axis in Fig.5(b)is along

the orientation of the drive comb fingers.The sensitivity of a gyroscope is proportional to mechanical sensitivity and capac-itance gradient,as shown in the following equations,where it is assumed

that

is the proof

mass,

is the number of the drive comb fingers

and

and

,

and

m

and

m or

more can be achieved.For the vertical drive topology,the drive motion is out-of-plane and limited by the thickness of the alu-minum/oxide composite layer,which is about

5

are the

drive amplitudes for the respective topologies.Therefore,the quadrature ratio of the two topologies is given

by

as discussed above.Ac-

cording to (6),

large

-axis in Fig.5(a),and the

C OMPARISON OF THE T WO T OPOLOGY D

ESIGNS

present in the x-direction of the vertical sensing topology and in the y-direction of the vertical drive topology.Again,because of the curling and small thickness of the thin-film vertical springs,the vertical drive topology has much larger coupling motion.The other off-axis motion source is from the direct electro-static drive force.According to the comb drive designs shown in Fig.5,both topologies have this off-axis motion along the transverse direction

(

m in the vertical actuation case but about

5

-axis spring beams.

The stiffness ratio in (12)may vary from 10to 100.Overall,the vertical actuation topology has about 60-to 80-dB greater cross-sensitivity than the vertical sensing if only the off-axis drive motion is considered.

The performance comparison of these two topologies is summarized in Table I.The table shows that the vertical drive topology has higher sensitivity,but rest of the parameters are favorable to the vertical sense topology.Therefore,the vertical-axis sense lateral-axis drive topology is chosen for best performance.

The detailed topology is shown in Fig.7,which primarily consists of

a

-axis capacitive sensor,

a

-axis actuator also are integrated to control the exci-tation vibration and compensate the coupled motion.All the sensors and actuators are in the form of comb drives with the geometric parameters listed in Table II.The

-axis actuators to form an os-cillator.However,in the experiments,the gyroscope is driven open loop.

The

-axis drive is divided into four groups through

the electrical isolation of silicon.For instance,if the vibrating structure is imbalanced and rotates clockwise,the voltages on x-drive1and x-drive4can be increased to balance the rotation.The main design parameters are listed in Table III.The gyro-scope operates at atmospheric pressure.Vacuum packaging will not be employed since microstructures can be easily damaged in vacuum without special protection.Vacuum packaging will also drastically increase the cost.The quality factors,Q,listed in Table III,are measured in air.The drive mode has larger Q than the sense mode because the drive comb fingers have only

3-

G EOMETRIC P ARAMETERS OF C OMB D RIVES OF THE G

YROSCOPE

TABLE III D ESIGN D ATA S

HEET

Fig.8.Coventorware 3-D solid model of the gyroscope.

TABLE IV

F IRST F OUR M ODES OF THE Y-A XIS G

YROSCOPE

structure,the comb fingers simply contribute effective mass.Fig.8shows the 3-D solid model generated by Coventorware [19],in which the comb fingers are eliminated and modeled as solid plates.The thickness of the structure is

55

m thick.

The

m wide with a

0.9--axis sense mode.

The sense modes are designed

to be 25%higher than

the

-axis drive resonance.Further

suppression of the

m three-metal CMOS process.The

post-CMOS processing sequence shown in Fig.1was used to fabricate the device.The DRIE silicon etch steps were per-formed with a surface technology systems inductively coupled plasma etching system.The DRIE process parameters are set to a 12-s etch cycle time with 130sccm

SF

F

m/min.

The thickness of the silicon membrane was about

60

,16sccm O

m that was measured on test beams using scanning elec-tron micrograph.

A scanning electron micrograph (SEM)of a fabricated de-vice is shown in Fig.9.The drive fingers are located on the two sides of the device.The total area of the microstructure is

Fig.10.Frequency response of the proof mass displacement with voltage applied to the x -axis drive comb fingers.

250-

-direc-tion.Both the FEM simulation and SEM show that the

thin-film

-axis sense comb fingers are also divided into four

groups to form a common-centroid configuration to reduce the cross-axis sensitivity and compensate the process variations.Each group has a pair of differential comb-finger subgroups to minimize

the

”in Fig.9,where 18-V dc and 5-V ac were

applied to

the

-axis at resonance,however,outside of

resonance

the

-axis drive modes.The larger damping in the

out-of-plane modes results from the large number of long,thick sense comb fingers.In contrast,the drive comb fingers have only

3--axis comb

drive excitation was used.

The

-axis sense

(a)(b)

Fig.14.Spectrum of the output signal.(a)At5Hz33

s

to s.The result is plotted in Fig.12,where the data was

acquired automatically in12.5min using Labview.The sensi-

tivity is about0.4mV

dB above the noise

0.02s/Hz.The calculated Brownian noise is0.01s/Hz,

with consideration of the noise folding due to the modulation.

The on-chip electronics noise is estimated to be10nV/Hz,

which is equivalent to0.005s/Hz.The Brownian noise is

from the on-chip electronics and the off-chip circuits.

All the comb drives for off-axis motion compensation are

electrically grounded in the above experiments.However,some

experiments were also performed by using these comb drives to

reduce the coupled motion in the sense mode(along the

An experiment was also conducted to study the coupled mo-tions.Since quadrature is in phase with the primary vibration,there is a 90

phase lag between the ZRO and Cori-olis signal indicates that the direct-coupled motion dominates the quadrature motion in the operation of this device [21].

Electrostatic force generated by a comb drive exists in all three directions due to small offsets.There is a 90

-axis because the lateral drive

resonance which is much lower than the resonance of the outer

frame

-axis motion and quadrature motion.

VII.C ONCLUSION

A DRIE lateral-axis vibrating gyroscope with out-of-plane capacitive sensing was demonstrated by using a DRIE CMOS-MEMS process.The successful function of the lat-eral-axis gyroscope implies the feasibility of making 6-DOF inertial measurement units by using the DRIE CMOS-MEMS process.With significant circuit design effort,electronics for the complete gyroscope system are able to be included on chip.Higher resolution can be achieved by increasing the device size,however then the noise of the on-chip electronics must be reduced.Full system control and a differential vibratory topology are also required for reduction of zero-rate offset.A vertical-force cancellation technique is needed to reduce the direct coupling.The overall performance can be further improved by design optimization [22],[23].

A CKNOWLEDGMENT

The authors would like to thank Dr.H.Luo (now at Hewlett-Packard),for help in circuit design,and Mr.J.Geen of Analog Devices,Inc.,for valuable discussions.

R EFERENCES

[1]H.Xie and G.K.Fedder,“A CMOS-MEMS lateral-axis gyroscope,”in

Proc.14th IEEE Int.Conf.Microelectromechanical Systems ,Interlaken,Switzerland,Jan.21–25,2001,pp.162–165.

[2]H.Luo,X.Zhu,https://www.doczj.com/doc/ea13812779.html,kdawala,L.R.Carley,and G.K.Fedder,“A

copper CMOS-MEMS z-axis gyroscope,”in Proc.15th IEEE Int.Conf.Microelectromechanical Systems ,Las Vegas,NV ,Jan.21–25,2001,pp.631–634.

[3]H.Xie,L.Erdmann,X.Zhu,K.J.Gabriel,and G.K.Fedder,

“Post-CMOS processing for high-aspect-ratio integrated silicon mi-crostructures,”IEEE/ASME J.Microelectromech.Syst.,vol.11,pp.93–101,Feb.2002.

[4]G.K.Fedder,S.Santhanam,M.L.Reed,S.C.Eagle,D.F.Guillou,M.

S.-C.Lu,and L.R.Carley,“Laminated high-aspect-ratio microstruc-tures in a conventional CMOS process,”Sens.Actuators A ,vol.A57,pp.103–110,1996.

[5] B.Boxenhorn,“Planar Inertial Sensor,”U.S.patent no 4598585.

[6]P.Greiff,B.Boxenhorn,T.King,and L.Niles,“Silicon monolithic mi-[7]J.Bernstein,S.Cho,A.T.King,A.Kourepenis,P.Maciel,and M.Wein-berg,“A micromachined comb-drive tuning fork rate gyroscope,”in Proc.IEEE Microelectromechanical Systems ,Fort Lauderdale,FL,Feb.7–10,1993,pp.143–148.

[8]M.W.Putty and K.Najafi,“A micromachined vibrating ring gyro-scope,”in Tech.Dig.Solid-State Sens.Actuator Workshop ,Hilton Head Island,SC,June 13–16,1994,pp.213–220.

[9]W.A.Clark,R.T.Howe,and R.Horowitz,“Surface micromachined

z-axis vibratory rate gyroscope,”in Proc.Tech.Dig.Solid-State Sens.Actuator Workshop ,Hilton Head Island,SC,June 3–6,1996,pp.283–287.

[10]T.Juneau,A.P.Pisano,and J.H.Smith,“Dual axis operation of a mi-cromachined rate gyroscope,”in Tranducers ,Chicago,IL,June 16–19,1997,pp.883–886.

[11]J.A.Geen,S.J.Sherman,J.F.Chang,and S.R.Lewis,“Single-chip sur-face-micromachining integrated gyroscope with 50deg/hour root Allan variance,”in Dig.IEEE Int.Solid-State Circuits Conf.,San Francisco,CA,Feb.3–7,2002,pp.426–427.

[12]T.K.Tang et al.,“A packaged silicon MEMS vibratory gyroscope for

microspacecraft,”in Proc.10th IEEE Int.Conf.Microelectromechanical Systems ,Nagoya,Japan,Jan.26–30,1997,pp.500–505.

[13]Y .Mochida,M.Tamura,and K.Ohwada,“A micromachined vibrating

rate gyroscope with independent beams for the drive and detection modes,”in Proc.12th IEEE Int.Conf.Microelectromechanical Systems ,Orlando,FL,Jan.17–21,1999,pp.618–623.

[14]M.Lutz,W.Golderer,J.Gerstenmeier,J.Marek,B.Maihofer,S.

Mahler,H.Munzel,and U.Bischof,“Aprecision yaw rate sensor in silicon micromachining,”in Transducers ,Chicago,IL,June 16–19,1997,pp.847–850.

[15]W.Geiger,B.Folkmer,U.Sobe,H.Sandmaier,and https://www.doczj.com/doc/ea13812779.html,ng,“New

designs of micromachined vibrating rate gyroscopes with decoupled os-cillation modes,”Sens.Actuators A ,vol.66,pp.118–124,1998.

[16]K.Y .Park,H.S.Jeong,S.An,S.H.Shin,and C.W.Lee,“Lateral gyro-scope suspended by two gimbals through high aspect ratio ICP etching,”in Transducers ,Sendai,Japan,June 7–10,1999,pp.972–975.

[17]S.Adams,J.Groves,K.Shaw,T.Davis,D.Cardarelli,R.Carroll,J.

Walsh,and M.Fontanella,“A single-crystal silicon gyroscope with de-coupled drive and sense,”in Proc.SPIE ,vol.3876,1999,pp.74–83.[18]T.J.Brosnihan,J.M.Bustillo,A.P.Pisano,and R.T.Howe,“Em-bedded interconnect and electrical isolation for high-aspect-ratio,SOI inertial instruments,”in Transducers ,Chicago,IL,June 16–19,1997,pp.637–640.[19]MEMCAD User’s Manual .Cary,NC:Coventor,

https://www.doczj.com/doc/ea13812779.html,.

[20]W.Hemmert,M.S.Mermelstein,and D.M.Freeman,“Nanometer

resolution of 3-D motions using video interference microscopy,”in 12th IEEE Int.Conf.Microelectromechanical Systems ,Orlando,FL,Jan.17–21,1999,pp.302–308.

[21]H.Xie,G.K.Fedder,Z.Pan,and W.Frey,“Phase and vibration analysis

for a CMOS-MEMS gyroscope,”Int.J.Nonlinear Sci.Numer.Simula-tions ,vol.3,pp.319–324,2002.

[22]H.Luo,G.Zhang,L.R.Carley,and G.K.Fedder,“A post-CMOS mi-cromachined lateral accelerometer,”J.Microelectromech.Syst.,vol.11,pp.188–195,2002.

[23] C.Acar and A.Shkel,“A design approach for robustness improvement

of rate gyroscopes,”in Proc.Int.Conf.Modeling and Simulation of Mi-crosystems ,Hilton Head Island,SC,Mar.19–21,2001,pp.80–83.[24]V .A.Apostolyuk1,V .J.Logeeswaran,and F.E.H.Tay,“Efficient design

of micromechanical gyroscopes,”J.Micromech.Microeng.,vol.12,pp.948–954,

2002.

Huikai Xie received the B.S.and M.S.degrees in electronic engineering from the Beijing Institute of Technology,Beijing,China,the M.S.degree in electrooptics from Tufts University,Medford,MA,in 1998,and the Ph.D.degree in electrical and computer engineering from Carnegie-Mellon University,Pittsburgh,PA,in 2002.

He is an Assistant Professor at the Department of Electrical and Computer Engineering,University of Florida,Gainesville.From 1992to 1996,he was a Faculty Member at the Institute of Microelectronics,

Tsinghua University,Beijing,working on various silicon-based microsensors.He has published over 30technical papers.His present research interests include

Gary K.Fedder received the B.S.and M.S.degrees

in electrical engineering from the Massachusetts In-

stitute of Technology,Cambridge,in1982and1984,

respectively,and the the Ph.D.degree from the Uni-

versity of California,Berkeley,in1994,where his

research resulted in the first demonstration of mul-

timode control of a underdamped surface-microma-

chined inertial device.

He is currently a Professor at Carnegie-Mellon

University,Pittsburgh,PA,holding a joint ap-

pointment with the Department of Electrical and Computer Engineering and The Robotics Institute.From1984to1989,he was with the Hewlett-Packard Company,working on circuit design and printed-circuit modeling.He serves on the editorial board of the IOP Journal of Micromechanics and Microengineering and as coeditor of the Wiley-VCH Sensors Update book series.He has contributed to over90research publica-tions and several patents in the MEMS area.His research interests include microsensor and microactuator design and modeling,integrated MEMS manufactured in CMOS processes,and structured design methodologies for MEMS.

Dr.Fedder received the1993AIME Electronic Materials Society Ross Tucker Award,the1996Carnegie Institute of Technology https://www.doczj.com/doc/ea13812779.html,dd Award,and the 1996NSF CAREER Award.Currently,he serves as a subject Editor for the IEEE/ASME J OURNAL OF M ICROELECTROMECHANICAL S YSTEMS,

精神病学章节练习题 第六章 躯体疾病所致精神障碍

第六章躯体疾病所致精神障碍 【选择题】 (一)A型题 1.心脏病伴发的精神障碍,最多见的表现为 A.幻觉 B.妄想 C.抑郁发作 D. 焦虑情绪 E.行为迟缓 2.甲状腺功能减退伴发的精神障碍,禁用何种药物 A.氯丙嗪 B.奋乃静 C.地西泮 D. 氟哌啶醇 E.舒必利 3.垂体前叶功能减退伴发的精神障碍,治疗时禁用 A.氯丙嗪 B.奋乃静 C.地西泮 D. 肾上腺皮质激素 E.甲状腺素 4.严重的一氧化碳中毒可以出现假愈期,假愈期最长可达 A.10周 B.4周 C.6周 D. 1周 E.12周 5.肾上腺皮质激素引起的精神障碍,常发生于用药后 A.数分钟 B.数小时 C.数天到一周 D.数天或2个月内 E.半年以上 6.肾上腺皮质激素所致的精神障碍与哪种因素无关 A.用药剂量与持续的时间 B.病前性格 C.个体的机能状况 D.以上都是 E.以上都不是 7.某女性病人,分娩时大出血,产后体弱,表现乏力,消瘦,乳房萎缩,全身毛发脱落。一年后出现疑人害,吵闹,不认识自己的亲人,外出不知归家。此病人最可能的诊断是A.红斑狼疮所致的精神障碍 B.多发性硬化 C.白塞病所致精神障碍D. 席汉病所致精神障碍E.阿狄森病所致精神障碍 8.男性患者,36岁。入院诊断乙肝后肝硬化。患者妻子向你报告他有些反常,如刷过牙又找牙刷,说要去刷牙,东西放置比平时凌乱。情绪不稳,有时显得很高兴,有时又流泪。检查时发现患者一般对答尚切题,对刷牙一事,不好意思地说“忘了”。这时你的判断和首先需要做的是 A.在病历上记录患者家属反映的情况和你的检查结果,继续观察 B.安慰家属,告诉她病人反应正常,不必过分担心 C.向护士或同病室的病友了解情况 D.注意检查患者的认知功能,提防肝性脑病的发生 E.复查肝功能 9.糖尿病伴发的精神障碍治疗时下列哪种药物需要慎用或禁用 A.氯丙嗪 B.氟哌啶醇 C.地西泮 D. 阿普唑伦 E.多塞平 10.躯体感染性疾病所致精神障碍以下哪条不对 A.起病较急,病程发展常起伏不定 B.精神症状通常与感染性躯体疾病消长平行 C.大多预后不良 D.及时发现原发感染性疾病是正确诊断的关键 E.处理上最重要的是治疗原发疾病 11.躯体疾病所致的精神障碍的处理原则以下哪项不对 A.首先必须治疗引起精神障碍的原发躯体疾病 B.支持疗法包括维持水电解质平衡、充足的营养供应等 C.护理包括安静、安全的环境和防止意外发生等

精神分裂症的病因及发病机理

精神分裂症的病因及发病机理 精神分裂症病因:尚未明,近百年来的研究结果也仅发现一些可能的致病因素。(一)生物学因素1.遗传遗传因素是精神分裂症最可能的一种素质因素。国内家系调查资料表明:精神分裂症患者亲属中的患病率比一般居民高6.2倍,血缘关系愈近,患病率也愈高。双生子研究表明:遗传信息几乎相同的单卵双生子的同病率远较遗传信息不完全相同 的双卵双生子为高,综合近年来11项研究资料:单卵双生子同病率(56.7%),是双卵双生子同病率(12.7%)的4.5倍,是一般人口患难与共病率的35-60倍。说明遗传因素在本病发生中具有重要作用,寄养子研究也证明遗传因素是本症发病的主要因素,而环境因素的重要性较小。以往的研究证明疾病并不按类型进行遗传,目前认为多基因遗传方式的可能性最大,也有人认为是常染色体单基因遗传或多源性遗传。Shields发现病情愈轻,病因愈复杂,愈属多源性遗传。高发家系的前瞻性研究与分子遗传的研究相结合,可能阐明一些问题。国内有报道用人类原癌基因Ha-ras-1为探针,对精神病患者基因组进行限止性片段长度多态性的分析,结果提示11号染色体上可能存在着精神分裂症与双相情感性精神病有关的DNA序列。2.性格特征:约40%患者的病前性格具有孤僻、冷淡、敏感、多疑、富于幻想等特征,即内向

型性格。3.其它:精神分裂症发病与年龄有一定关系,多发生于青壮年,约1/2患者于20~30岁发病。发病年龄与临床类型有关,偏执型发病较晚,有资料提示偏执型平均发病年龄为35岁,其它型为23岁。80年代国内12地区调查资料:女性总患病率(7.07%。)与时点患病率(5.91%。)明显高于男性(4.33%。与3.68%。)。Kretschmer在描述性格与精神分裂症关系时指出:61%患者为瘦长型和运动家型,12.8%为肥胖型,11.3%发育不良型。在躯体疾病或分娩之后发生精神分裂症是很常见的现象,可能是心理性生理性应激的非特异性影响。部分患者在脑外伤后或感染性疾病后发病;有报告在精神分裂症患者的脑脊液中发现病毒性物质;月经期内病情加重等躯体因素都可能是诱发因素,但在精神分裂症发病机理中的价值有待进一步证实。(二)心理社会因素1.环境因素①家庭中父母的性格,言行、举止和教育方式(如放纵、溺爱、过严)等都会影响子女的心身健康或导致个性偏离常态。②家庭成员间的关系及其精神交流的紊乱。③生活不安定、居住拥挤、职业不固定、人际关系不良、噪音干扰、环境污染等均对发病有一定作用。农村精神分裂症发病率明显低于城市。2.心理因素一般认为生活事件可发诱发精神分裂症。诸如失学、失恋、学习紧张、家庭纠纷、夫妻不和、意处事故等均对发病有一定影响,但这些事件的性质均无特殊性。因此,心理因素也仅属诱发因

recommendations for the characterization of immunogenicity

Review Recommendations for the characterization of immunogenicity response to multiple domain biotherapeutics Boris Gorovits a ,?,Eric Wakshull b ,Renuka Pillutla c ,Yuanxin Xu d ,Marta Starcevic Manning e ,Jaya Goyal f a P ?zer,United States b Genentech,United States c BMS,United States d Sano ?US,United States e Amgen,United States f Biogen Idec,United States a r t i c l e i n f o a b s t r a c t Article history: Received 13November 2013 Received in revised form 15May 2014Accepted 15May 2014 Available online 24May 2014 Many biotherapeutics currently in development have complex mechanisms of action and contain more than one domain,each with a specific role or function.Examples include antibody –drug conjugates (ADC),PEGylated,fusion proteins and bi-specific antibodies.As with any biotherapeutic molecule,a multi-domain biotherapeutic (MDB)can elicit immune responses resulting in the production of specific anti-drug antibodies (ADA)when administered to patients.As it is beneficial to align industry standards for evaluating immunogenicity of MDBs,this paper highlights pertinent immunogenicity risk factors and describes steps involved in the design of a testing strategy to detect and characterize binding (non-neutralizing and neutralizing,NAb)ADAs.In a common tier based approach,samples identified as ADA screen positive are confirmed for the binding specificity of the antibodies to the drug molecule via a confirmatory assay.The confirmation of specificity is generally considered as a critical step of the tier based approach in overall ADA response evaluation.Further characterization of domain specificity of polyclonal anti-MDB ADA response may be required based on the analysis of molecule specific risk factors.A risk based approach in evaluating the presence of NAbs for MDB is discussed in this article.Analysis of domain-specific neutralizing antibody reactivity should be based on the risk assessment as well as the information learned during binding ADA evaluation.Situations where additional characterization of NAb specificity is possible and justified are discussed.Case studies demonstrating applicability of the risk factor based approach are presented.In general,the presence of a domain with high immunogenicity risk or presence of a domain with high endogenous protein homology may result in an overall high immunogenicity risk level for the entire MDB and can benefit from domain specificity characterization of immune response.For low immunogenicity risk MDBs,domain specificity characterization could be re-considered at later clinical phases based on the need to explain specific clinical observations.Inclusion of domain specificity characterization in early phase clinical studies for MDBs with limited clinical immunogenicity experience may be considered to help understand its value in later clinical development.It is beneficial and is recommended to have a well-defined plan for the Keywords: Multi-domain biotherapeutic Immunogenicity response characterization Anti-drug antibody Journal of Immunological Methods 408(2014)1–12 ?Corresponding author at:Pfizer,1Burtt Rd,Andover,MA 01810,United States.E-mail address:boris.gorovits@p ?https://www.doczj.com/doc/ea13812779.html, (B. Gorovits). https://www.doczj.com/doc/ea13812779.html,/10.1016/j.jim.2014.05.010 0022-1759/?2014Elsevier B.V.All rights reserved. Contents lists available at ScienceDirect Journal of Immunological Methods j o u r n a l h o me p a g e :w ww.e l s e v i e r.c o m /l oc a te /j i m

医师定期考核试题中枢性尿崩症的诊疗内分泌科

医师定期考核试题中枢性尿崩症的诊疗内分泌科 一、A2型题 1.男性,30岁,烦渴、多饮、多尿2个月。尿量每天8000ml,禁饮水7小时时血渗透压305mOsm/kg·H2O,尿量110ml/小时,尿渗透压250mOsm/kg·H2O,尿比重1.006,皮下注射垂体后叶素3mg后,第2小时尿量25ml,尿渗透压480mOsm/ kg·H2O,尿比重1.012,诊为完全性中枢性尿崩症。首选的处理是 A.嘱限制饮水量 B.去氨加压素(弥凝)治疗 C.鞍区MRI检查 D.垂体功能检查 E.测定血电解质水平 【本题1.0分,建议1.0分钟内完成本题】 【隐藏答案】 【正确答案】:B 【您的回答】:【得分:0.0】 二、A1型题 1.高位截瘫病人排尿障碍表现为 A.尿失禁

B.尿潴留 C.无尿 D.尿崩症 E.少尿 【本题1.0分,建议1.0分钟内完成本题】【隐藏答案】 【正确答案】:A 【您的回答】:【得分:0.0】 2.部分性尿崩症是指禁水后 A.1.010<尿比重<1.015 B.1.015<尿比重<1.020 C.1.005<尿比重<1.010 D.1.010<尿比重<1.020 E.1.020<尿比重<1.025 【本题1.0分,建议1.0分钟内完成本题】【隐藏答案】 【正确答案】:B 【您的回答】:【得分:0.0】

3.禁水-加压素试验尿渗透压升高,见于A.正常人 B.精神性烦渴 C.肾性尿崩症 D.中枢性尿崩症 E.慢性肾脏疾病 【本题1.0分,建议1.0分钟内完成本题】【隐藏答案】 【正确答案】:D 【您的回答】:【得分:0.0】 4.中枢性尿崩症患者控制多尿最适宜的药物是A.垂体后叶素水剂 B.油剂鞣酸加压素(长效尿崩停) C.去氨加压素(弥凝) D.双氢克尿塞 E.氯磺丙脲 【本题1.0分,建议1.0分钟内完成本题】【隐藏答案】 【正确答案】:C

药理学(9)模拟试卷

[模拟] 药理学(9) A1型题每一道考试题下面有A、B、C、D、E五个备选答案。请从中选择一个最佳答案。 第1题: 毛果芸香碱选择性激动的受体是 A.M受体 B.N1受体 C.N2受体 D.α受体 E.β受体 参考答案:A 第2题: 毛果芸香碱滴眼可产生哪种作用 A.近视、扩瞳 B.近视、缩瞳 C.远视、扩瞳 D.远视、缩瞳 E.虹膜角膜角变窄 参考答案:B 第3题: 常用的表示药物安全性的参数是 A.半数致死量 B.半数有效量 C.治疗指数 D.最小有效量 E.极量 参考答案:C 第4题: 糖皮质激素用于慢性炎症的目的是

A.抑制花生四烯酸释放,使PG合成减少 B.具有强大抗炎作用,促进炎症消散 C.使炎症部位血管收缩,通透性下降 D.抑制肉芽组织生长,防止粘连和疤痕 E.稳定溶酶体膜、减少蛋白水解酶的释放 参考答案:D 第5题: 毛果芸香碱降低眼内压的机制是 A.水生成减少 B.使睫状肌收缩 C.使瞳孔括约肌收缩 D.使瞳孔开大肌收缩 E.使后房血管收缩 参考答案:C 第6题: 甲亢患者,经丙基硫氧嘧啶治疗两个月后,症状未见好转,甲状腺肿块有压迫症状,遂行手术治疗,术后出现粘液性水肿,应该 A.服用碘剂 B.服用甲状腺素片 C.服用糖皮质激素 D.服用利尿剂 E.补充蛋白质 参考答案:B 第7题: 下列有关生物利用度的叙述错误的是 A.它与药物的作用强度无关 B.它与药物的作用速度有关 C.首关消除对其有影响 D.口服吸收的量与服药量成正比 E.它与曲线下面积成正比 参考答案:A

第8题: 治疗胆绞痛应首选 A.阿托品 B.哌替啶 C.阿司匹林 D.阿托品+哌替啶 E.阿托品+阿司匹林 参考答案:D 第9题: 局麻药的局麻作用机制是 A.促进Cl-内流,使神经细胞膜产生超极化 B.阻碍Za+内流,抑制神经细胞膜去极化 C.阻碍K+外流,使神经细胞膜产生超极化 D.阻碍Ca2+内流,抑制神经细胞膜去极化 E.促进K+内流,阻碍神经细胞膜去极化 参考答案:B 第10题: 异丙肾上腺素不宜用于 A.房室传导阻滞 B.心脏骤停 C.支气管哮喘 D.冠心病 E.感染性休克 参考答案:D 第11题: 下列作用不属于酚妥拉明的是 A.竞争性阻断α受体 B.扩张血管,降低血压 C.抑制心肌收缩力,心率减慢

精神分裂症的发病原因是什么

精神分裂症的发病原因是什么 精神分裂症是一种精神病,对于我们的影响是很大的,如果不幸患上就要及时做好治疗,不然后果会很严重,无法进行正常的工作和生活,是一件很尴尬的事情。因此为了避免患上这样的疾病,我们就要做好预防,今天我们就请广州协佳的专家张可斌来介绍一下精神分裂症的发病原因。 精神分裂症是严重影响人们身体健康的一种疾病,这种疾病会让我们整体看起来不正常,会出现胡言乱语的情况,甚至还会出现幻想幻听,可见精神分裂症这种病的危害程度。 (1)精神刺激:人的心理与社会因素密切相关,个人与社会环境不相适应,就产生了精神刺激,精神刺激导致大脑功能紊乱,出现精神障碍。不管是令人愉快的良性刺激,还是使人痛苦的恶性刺激,超过一定的限度都会对人的心理造成影响。 (2)遗传因素:精神病中如精神分裂症、情感性精神障碍,家族中精神病的患病率明显高于一般普通人群,而且血缘关系愈近,发病机会愈高。此外,精神发育迟滞、癫痫性精神障碍的遗传性在发病因素中也占相当的比重。这也是精神病的病因之一。 (3)自身:在同样的环境中,承受同样的精神刺激,那些心理素质差、对精神刺激耐受力低的人易发病。通常情况下,性格内向、心胸狭窄、过分自尊的人,不与人交往、孤僻懒散的人受挫折后容易出现精神异常。 (4)躯体因素:感染、中毒、颅脑外伤、肿瘤、内分泌、代谢及营养障碍等均可导致精神障碍,。但应注意,精神障碍伴有的躯体因素,并不完全与精神症状直接相关,有些是由躯体因素直接引起的,有些则是以躯体因素只作为一种诱因而存在。 孕期感染。如果在怀孕期间,孕妇感染了某种病毒,病毒也传染给了胎儿的话,那么,胎儿出生长大后患上精神分裂症的可能性是极其的大。所以怀孕中的女性朋友要注意卫生,尽量不要接触病毒源。 上述就是关于精神分裂症的发病原因,想必大家都已经知道了吧。患上精神分裂症之后,大家也不必过于伤心,现在我国的医疗水平是足以让大家快速恢复过来的,所以说一定要保持良好的情绪。

设备制造质量检验规程(Storage-Tanks-Shop-Fabrication)

MANUFACTURERS WORKS Date:11/03/04 INSPECTION GUIDELINES STORAGE TANKS PREFABRICATION IN MANUFACTURERS WORKS 0For Approval11/03/2004J. C. Brotton B. Tremain B. Tremain June 2004 Rev.Description Date Prepared Checked Approved Date

MANUFACTURERS WORKS Date:11/03/04 CONTENTS 1PURPOSE 2SCOPE 3PROCEDURE 4DOCUMENTS 5INSPECTION PROCESS 6SHIPPING 7STORAGE TANK DATA DOSSIER 8INSPECTION CHECK LIST

MANUFACTURERS WORKS Date:11/03/04 1.0 PURPOSE This instruction covers the inspection, test and verification activities required to validate the supply, manufacture and test of storage tanks for general use in refineries and chemical plants. This instruction is primarily for mill and prefabrication stages at fabricators works 2.0 SCOPE This instruction covers all necessary stages in the production of the storage tank from the examination of certification from procurement sources to the final inspection, preservation and packing to despatch to site. Although the methodology in compiling this instruction is to systematically progress through the construction of a typical storage tank. Experienced, inspectors may interpret the intent of the instruction to accommodate local or novel practices or to utilise the instruction for a one-off design of storage tank, the design having been approved by the client. Any such variations should be noted on the inspector's report. 3.0 PROCEDURE 3.1 GENERAL This instruction together with its associated check sheet may be used on any order or contract. It is intended to act as a guide to the inspector in the course of the inspection programme. Any part of the document may be invoked and the sections to be used and the level of inspection required will be specified on the check list. All tests and inspections will be carried out against the approved drawings, purchase order specifications, purchasers or company standards, and within the practices and rules of the country, state or province and any government decrees, laws, ordinance or regulation as may apply. If any conflict or contradictions should be apparent in any of the above then the more onerous requirement will apply unless the purchaser or client directs otherwise in writing. 3.2 REFERENCE DOCUMENTS Applicable codes and specifications. ?Design code (to be stated on inspection report) ?Purchase order specification ?Purchaser's standards ?Approved drawings ?SGS company standards Applicable codes and standards (sample only) ?BS 2654 ?BS 2594 ?BS 7777 ?API 620 ?API 650 ?API 653 ?EEMUA 159

判断与选择题

二.判断题: 72 1.二尖瓣狭窄,当出现急性肺气肿时,常可咯大量新鲜血液,易窒息。 2.咯血患者可出现柏油样大便,咯血停止后仍持续数日。 三.名词解释: 咯血 四.选择题: A型题: 1.国内咯血最常见的病因是:( ) A.流行性出血热 B.肺结核 C.肺炎 D.支气管结核 E.支气管扩张 2.下列哪项是正确的:( ) A.每日咯血<150ml为小量咯血 B.咯血前患者常有胸闷,恶心,呕吐C.一次咯血量>500ml D.咯出的血液常呈酸性 E.咯血患者宜健侧卧位,以利血液排除 B型题: 问题3~6 A.大量咯血伴低热 B.持续痰中带血伴Horner氏综合征 C.稍有痰中带血伴剧咳 D.间断咯血伴大量脓痰 E.周期性咯血 3.支气管子宫内膜异位症 ( ) 4.支气管扩张 ( ) 5.肺结核空洞 ( ) 6.支气管肺癌 ( ) C型题: 问题7~8 A.大咯血 B.痰中带血丝 C.两者都有 D.两者都无 7.左心衰 ( ) 8.肺脓肿 ( ) X型题: 9.下列哪些是我国常见的咯血原因:() A.肺结核 B.支气管扩张 C.慢性支气管炎 D.肺癌 E.风湿性心脏病二尖瓣狭窄 二. 选择题 51 A型题 1.下列哪项不居于全身性水肿:() A.心源性水肿 B.肝源性水肿 C.营养不良性水肿

D.肾源性水肿 E.过敏性水肿 2.男,30岁,近4年来经常间发四肢关节疼痛,近来感乏力、纳差、心悸、气促,肝在肋下2.5cm触及,轻触痛。查血红蛋白97g/L,尿蛋白(十);双 下肢轻度浮肿。其原因最可能为:() A.肝硬化 B.急性肾炎 C.主动脉瓣狭窄致左心衰 D.二尖瓣狭窄致右心衰 E.营养不良 3.为了鉴别诊断,对水肿病人在收集病史中,下列哪项不重要:() A. 水肿首先发生的部位 B. 水肿是否为凹陷性 C. 伴随水肿发生的症状 D. 水肿与体位改变有无关系 E. 水肿发生后尿量的变化 4.女,30岁,伯冷,腹胀,经期延长,量多,全身肿胀,以经前为甚,较硬。B超示甲状腺肿大、肝脏肿大及脂肪肝。其皮肤肿胀的原因是:() A. 神经血管性水肿 B.肝硬化 C. 甲状腺功能减退症 D.淡漠型甲亢 E.营养不良 5.全身水肿伴胸腹水,下列哪项疾病不予考虑?() A.肺心病心衰 B.晚期肝硬化 C.尿毒症 D.肾病综合征 E. 席汉综合征 6. 尿毒症性全身水肿患者下列哪项体征几乎不出现? () A.心脏收缩期杂音 B.肾区叩痛 C.胸水体征 D.心包积液体征 E,肝颈静脉回流征阳性 7.一患者重度水肿。体查:颈静脉怒张,二尖瓣区收缩期杂音3/6级,肝区触痛明显,双下肢肿胀发亮。化验:肝功能异常,血清蛋白15g/L,尿蛋白 (十)。该患者下列哪项诊断不予考虑? () A.肾源性水肿 B.肝源性水肿 C.心源性水肿 D.下腔静脉阻塞 E.上腔静脉阻塞 8.一全身性水肿患者,下列哪项原因可不予考虑? ()

精神分裂症的病因是什么

精神分裂症的病因是什么 精神分裂症是一种精神方面的疾病,青壮年发生的概率高,一般 在16~40岁间,没有正常器官的疾病出现,为一种功能性精神病。 精神分裂症大部分的患者是由于在日常的生活和工作当中受到的压力 过大,而患者没有一个良好的疏导的方式所导致。患者在出现该情况 不仅影响本人的正常社会生活,且对家庭和社会也造成很严重的影响。 精神分裂症常见的致病因素: 1、环境因素:工作环境比如经济水平低低收入人群、无职业的人群中,精神分裂症的患病率明显高于经济水平高的职业人群的患病率。还有实际的生活环境生活中的不如意不开心也会诱发该病。 2、心理因素:生活工作中的不开心不满意,导致情绪上的失控,心里长期受到压抑没有办法和没有正确的途径去发泄,如恋爱失败, 婚姻破裂,学习、工作中不愉快都会成为本病的原因。 3、遗传因素:家族中长辈或者亲属中曾经有过这样的病人,后代会出现精神分裂症的机会比正常人要高。 4、精神影响:人的心里与社会要各个方面都有着不可缺少的联系,对社会环境不适应,自己无法融入到社会中去,自己与社会环境不相

适应,精神和心情就会受到一定的影响,大脑控制着人的精神世界, 有可能促发精神分裂症。 5、身体方面:细菌感染、出现中毒情况、大脑外伤、肿瘤、身体的代谢及营养不良等均可能导致使精神分裂症,身体受到外界环境的 影响受到一定程度的伤害,心里受到打击,无法承受伤害造成的痛苦,可能会出现精神的问题。 对于精神分裂症一定要配合治疗,接受全面正确的治疗,最好的 疗法就是中医疗法加心理疗法。早发现并及时治疗并且科学合理的治疗,不要相信迷信,要去正规的医院接受合理的治疗,接受正确的治 疗按照医生的要求对症下药,配合医生和家人,给病人创造一个良好 的治疗环境,对于该病的康复和痊愈会起到意想不到的效果。

Three-Dimensional Micro-Channel Fabrication in Polydimethylsiloxane (PDMS) Elastomer

Three-Dimensional Micro-Channel Fabrication in Polydimethylsiloxane(PDMS)Elastomer Byung-Ho Jo,Linda M.Van Lerberghe,Kathleen M.Motsegood,and David J.Beebe,Member,IEEE Abstract—This paper describes a fabrication technique for building three-dimensional(3-D)micro-channels in polydimethyl- siloxane(PDMS)elastomer.The process allows for the stacking of many thin(less than100-

Fig.1.Schematic illustration of the sandwich molding process for thin upper layers.(a)A master for each layer was formed on a silicon wafer using SU-8photoresist and standard photolithography procedures.(b)Next,the PDMS prepolymer mixture was poured onto the master.(c)A transparency film was placed over the poured prepolymer mixture.(d)A multilayer stack of aluminum plates,the mold master,the PDMS prepolymer mixture,a transparency film,a rigid Pyrex wafer,and a rubber sheet is used to form a compression mold.(e)Finally,all the layers are clamped tightly during the cure. Fig.2.Scheme for fabricating a thick bottom layer and off-chip connection via the bottom layer.(a)A master for the bottom layer.(b)Molding a thick bottom layer in a petri dish.(c)A bottom layer containing “L-shaped micro-tunnels and tube connections. photoresist (MicroChem Corporation XP SU-850,Newton,MA)on silicon wafers.Fig.1(a)shows a master formed on a silicon wafer using the SU-8photoresist.To realize the thin flat layers with openings,a sandwich molding configuration was developed.Fig.1(b)–(e)illustrates schematically the sandwich molding procedure.A curing agent and PDMS prepolymer (SYLGARD 184Silicone Elastomer Kit,Dow Corning,Mid-land,MI)were thoroughly mixed in a 1:10weight ratio.The prepolymer mixture was degassed at 20–50mtorr in a desic-cator with a mechanical vacuum pump for 1h to remove any air bubbles in the mixture and to insure complete mixing between the two parts.The prepolymer mixture was poured onto the master,and then a transparency film was placed over the pre-polymer mixture.The transparency film was carefully lowered onto the prepolymer mixture,allowing surface tension to pull the transparency into intimate and continuous contact with the prepolymer mixture to prevent any bubbles from forming at the interface [see Fig.1(c)].The flexible transparency film provides an easy way to remove the cover plates from PDMS molds after curing.The master/prepolymer/transparency stack was then clamped within a sandwich that includes flat aluminum plates (top,bottom),a rigid Pyrex wafer,and a rubber sheet ( C on a hot plate.After curing,the thin PDMS replicas were peeled off from the masters. Most micro-fluidic systems require interconnection to the external world.Utilizing efficient off-chip connections via the thick (9mm)bottom PDMS layer allowed the top layer to remain smooth and flat for complete optical access (to facilitate micro-fluidic imaging studies).Fig.2shows the molding of a thick bottom layer and the coring procedure that was used to connect the fluidic device to an external fluid network with the inlet and outlet tubes.The master for the bottom layer was placed in a petri dish and then the prepolymer was poured onto the master to make a bottom layer thick enough so that inlet/outlet channels can be cored in it.The soft PDMS allows inlet/outlet channels to be created by pushing in and pulling out a 16-gauge syringe needle in the cured PDMS block.In order to create the “L”-shaped tunnels,vertical tunnels were first cored from the top and then horizontal connecting tunnels were made from the outside sidewall.Fig.2(c)shows a completed bottom layer that includes the “L”-shaped inlet/outlets and tubes connected to an external fluid network. B.Fabrication of 3-D Structures with 2-D Patterned Layers After fabricating the 2-D patterned layers,the layers were stacked onto a thick bottom layer and bonded together to form a 3-D channel structure.Fig.3(a)shows the top view of individual 2-D patterned layers for a 3-D serpentine channel mixer.The thick bottom layer has a negative relief pattern as the base of a 3-D channel on its surface.Each thin upper layer contains chan-nels and openings needed to realize the final 3-D channel struc-ture.Fig.3(b)is a high-magnification photograph that shows the stacked multiple layers forming a “L”-type mixer geom-etry.The 3-D serpentine channel was formed by stacking two thin 2-D layers on top of a thick bottom layer.The middle layer forms the vertical sections of the 3-D channel.The photograph also shows the good alignment between layers.The technique used for bonding alignment was to generate layers of exactly the same size by using a “standard”master periphery.A 90 m.Finally,

13级中专护理药物学期末A卷

13级中专护理、口腔、助产专业《药物学基础》期末考试A 卷 姓名___________班级______________学号_____________ 一、填空题(每空1分,共19分) 1.肾上腺素临床用于________、________、_______和_________。 2.五官科手术时常选用的局麻药是________。 3.癫痫大发作首选________;小发作首选________; 4.小剂量的阿司匹林主要用于_______。 5.治疗新生儿窒息常选用________。 6..强心苷的药理作用有_________、________、______和_______作用。 7.小剂量碘制剂可防治___________,大剂量碘制剂可用于___________和__________。 8.甲硝唑具有、、和作用。 二、名词解释(每题3分,共6分) 1.血浆半衰期 2. 抗生素 三、简答题(每题5分,共15分) 1.抗高血压药分为哪几类?各类药的代表药是什么药? 2.利尿药根据作用部位及强弱分哪几类?各类主要有哪些药? 3.青霉素的主要不良反应是什么?简述其防治措施。 四、选择题(每题1分,共60分) 1.强心苷主要用于 A.心绞痛 B.室性心律失常 C.传导阻滞 D.慢性心功能不全 2.观察使用强心苷类药物的患者,下列哪种情况可继续用药 A.恶心、呕吐加重 B.色觉障碍 C.心率70次/分 D.室性早搏呈二联律 3.强心苷中毒引起的快速型心律失常,应首选 A.利多卡因 B.苯妥英钠 C.美西律 D.维拉帕米4.患者,女性,59岁,血清总胆固醇含量增高,超过5.72mmol/L。请用下列哪种 药物 A.洛伐他汀 B.氯磺丙脲 C.甲苯磺丁脲 D.二甲双胍 5.哪种利尿药利尿作用最强 A.双氢克尿噻 B.呋塞米 C.氨苯喋啶 D.螺内酯 6.尿崩症患者可用下列哪种药物治疗 A、呋噻米 B、氢氯噻嗪 C、布美他尼 D、阿米洛利 7.急性肺水肿应首选 A.甘露醇 B.利尿酸 C.氨苯喋啶 D.呋塞米 8.选择性较高的β2受体激动药是 A.肾上腺素 B.麻黄碱 C.异丙肾上腺素 D.沙丁胺醇 9.原因不明的哮喘急性发作时,安全有效的平喘药是: A.肾上腺素 B. 吗啡 C.氨茶碱 D.沙丁胺醇 10.可待因主要用于 A.长期慢性咳嗽 B.无痰剧咳 C.多痰咳嗽 D.支气管哮喘 11.能中和胃酸的碱性药物 A 西米替丁B氢氧化铝 C 奥美拉唑D枸橼酸铋钾 12.西咪替丁治疗消化性溃疡病的机制是 A.阻断H2受体,抑制胃酸分泌 B.阻断M受体,抑制胃酸分泌 C.中和胃酸 D.抑制 胃壁细胞质子泵 13.西咪替丁最适宜治疗 A 慢性肠炎 B 十二指肠溃疡 C 慢性胃炎 D 消化不良 14.硫酸镁的作用不包括 A.导泻 B.利胆 C.利尿 D.降压 15.H1受体阻断剂常用于缓解 A 过敏性休克 B 过敏性哮喘 C 过敏性紫癜 D 缓解皮肤、粘膜过敏症状 16.驾驶员、车工或高空作业者在工作时间不宜使用的药物是 A 阿司咪唑 B 特非那啶 C 赛庚啶 D 异丙嗪 17.铁制剂与下列哪种物质同服能促进吸收 A.维生素C B.四环素 C.浓茶 D.牛奶 18.铁剂可用于治疗 A.巨幼红细胞性贫血 B.溶血性贫血 C.缺铁性贫血 D.自身免疫性溶血性贫血 19.防止新生儿出血最好选用 A.抑肽酶 B.维生素K C.氨甲环酸 D.垂体后叶素 20.弥散性血管内凝血早期可用 A.华法林B.氨甲苯酸C.肝素D.尿激酶 21.肝素过量所导致自发性出血可选用何药治疗 A.维生素K B.凝血酶 C.鱼精蛋白 D.氨甲环酸 22.对无产道障碍、胎位正常而宫缩无力的难产,可采用 A.大剂量缩宫素静脉滴注 B.大剂量麦角新碱静脉滴注C.小剂量缩宫素静脉 滴注 D.小剂量麦角新碱静脉滴注 23.麦角新碱在临床上主要用于 A.引产 B.催产 C.子宫出血 D.偏头痛 24.呆小症可选用 A.碘制剂 B.他巴唑 C.甲状腺片 D.丙基硫氧嘧啶 25.宜选用大剂量碘剂治疗的疾病是 A.单纯性甲状腺肿 B.呆小病 C.黏液性水肿 D.甲状腺危象 26.胰岛素的常用给药途径是 A.口服 B.皮下注射 C.静脉注射 D.舌下给药 27.下列不属于胰岛素不良反应的是 A.过量出现低血糖症 B.少数出现过敏反应 C.长期应用易致耐受性D.高血钾 28.对轻型肥胖糖尿病病人,单用饮食控制无效者宜选用 A.瑞格列奈 B.二甲双胍C.格列苯脲D胰岛素 29.糖皮质激素用于严重感染性疾病时必须 A逐渐加大剂量B加用促激素C与有效足量的抗菌药合用D防止诱发溃疡 30.糖皮质激素诱发和加重感染的主要原因为 A.激素用量不足,无法控制症状 B.病人对激素不敏感 C.激素促进了病原微生物的繁殖 D.因抗炎、抗免疫作用降低了机体的防御功能 31.长期应用糖皮质激素治疗的病人宜给予 A.低盐、低糖、高蛋白饮食 B.低盐、高糖、高蛋白饮食C.低盐、高糖、低 蛋白饮食 D.高盐、高糖、低蛋白饮食 32.抑制排卵的短效口服避孕药是 A.复方炔诺酮 B.炔诺酮 C.炔雌醇 D.米非司酮 33.抗菌药物抑制或杀灭微生物的能力称为 A.抗药性 B.抗菌谱 C.抗菌活性 D.耐受性 34.抗菌药物的抗菌范围称为 A.耐受性 B.抗菌活性 C.抗菌谱 D.抗菌机理 35.病原菌与抗菌药多次接触后,对抗菌药的敏感性降低、消失的现象称为 A.耐药性 B.耐受性 C.成瘾性 D.过敏反应 36.下列对青霉素G的叙述不正确的是 A. B.不耐青霉素酶 C. D. 37、青霉素不能作为首选药治疗 A.螺旋体感染B.淋病C.白喉D.病毒感染 38.治疗扁桃体炎宜选 A.青霉素G B.庆大霉素 C.红霉素 D.四环素 39.青霉素类最严重的不良反应是 A.胃肠道刺激症状 B.二重感染 C.肾损害 D.过敏性休克 40.不属于大环内酯类的是 A.红霉素 B.罗红霉素 C.克林霉素 D.阿奇霉素 41.红霉素的抗菌机制是 A.抑制菌体细胞壁合成 B.抑制菌体蛋白质合成 C.影响胞浆膜通透性 D.抑制叶酸 代谢

相关主题
文本预览
相关文档 最新文档