图1钎焊和扩散焊接头在170℃时效的界面IMC层横截面的SEM像
Fig?lsEMimagesofcross。sectionofIMClayersinsolderedanddiffusion—bondingjointsagedat170℃withoutma印eticfield:(a)solderedjoints,0h;(b)Diffusion。bondingjoints,0h;(c)Solderedjoints,250
h;(d)Diffusion.bondingjoints,256h
图2钎焊和扩散焊接头在170℃时效的界面IMC层晶粒的形貌
Fig?2MorphoiogiesofIMClayersinsolderedand
diffusion-bondingjointsagedat170℃withoutm姆leticfield:(a)Soldered
joints,50h;(b)Diffusionbondingjoints,50h;(c)Solderedjoints,250h;(d)Diffusionbondingjoints.256
h
粒减少。虽然两种试样的初始晶粒形貌不同,但经长时间时效后,都可以发现IMC晶粒长大与合并的现象。
经图像分析仪测定IMC层厚度,得到等温时效过程中IMC层厚度与时效时间的生长动力学(见图3),
其关系式可以用式(1)表示。
第18卷第3期程从前,等:Sn/Cu接头界面金属间化合物层的生长及强磁场的影响453
图5钎焊和扩散焊接头在190℃、磁场强度为8T时效界面IMC层的横截面形貌
Fig.5MorphologiesofcrosssectionsofIMClayersinsolderedanddiffusion-bondingjointsagedat190。Cin8Tofmagneticfieldstrength:(a)Solderedjoints,4h;(b)Solderedjoints,50h;(c)Diffusion-bondingjoints,4h;(b)Diffusion—bondingjoints,50h
图6钎焊和扩散焊在190℃、磁场强度为8T时效50h界面IMC层的形貌
Fig.6MorphologiesofIMClayersinsolderedanddiffusion?bondingjointsagedat190℃in8Tofmagneticfieldstrengthfor50h:(a)Solderedjoints;(b)Diffusion—bondingjoints
的圆棒状晶粒已经断裂而脱离了IMC基体,说明强磁场有利于圆棒状IMC的生长。由图6可看出,扩散焊IMC的晶粒组要为扇贝状晶粒,未发现圆棒状晶粒。与图2(b)比较,IMC晶粒更加均匀。从晶粒形貌的变化可知,磁场下时效,IMC晶粒也会发生长大与合并的现象;且钎焊和扩散焊试样IMC晶粒形貌的差异表明,强磁场并没有促进时效过程中短棒状晶粒的形核,而是促进了短棒状晶粒的生长。
图7所示为钎焊试样和扩散焊试样在190℃、磁场强度为8T时效的生长动力学曲线。由图7可看出,两种接头在强磁场下时效,IMC层的生长均符合厚度与时间1/2次方的直线关系,表明磁场下时效与无磁场下时效一样,均由扩散机制控制。两种接头在磁场下时效相同时间,IMC层生长的厚度接近。
图8所示为钎焊和扩散焊试样未时效和磁场强度为8T时效50h后界面IMC层的XRD谱。从图8可以看出,钎焊试样在0T未时效时特征峰为Cu_6Sn5(221)、Cu(220)和Cu6Sn5(442);经强磁场时效后,特征峰变为Cu6Sn5(22-)、Cu(220)、
Cu6Sn5(314),最强峰为Cu6Sn5(22T),某些小峰的
Sn/Cu接头界面金属间化合物层的生长及强磁场的影响
作者:程从前, 赵杰, 徐洋, 许富民, 杨朋, CHENG Cong-qian, ZHAO Jie, XU Yang,XU Fu-min, YANG Peng
作者单位:程从前,徐洋,杨朋,CHENG Cong-qian,ZHAO Jie,XU Yang,XU Fu-min,YANG Peng(大连理工大学,三束材料改性国家重点实验室,大连,116024), 赵杰,许富民(大连理工大学,材料科学与
工程学院,大连,116024)
刊名:
中国有色金属学报
英文刊名:THE CHINESE JOURNAL OF NONFERROUS METALS
年,卷(期):2008,18(3)
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