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Adsorption of arsenic from aqueous solution on

Adsorption of arsenic from aqueous solution on
Adsorption of arsenic from aqueous solution on

Journal of Hazardous Materials 144(2007)

522–531

Adsorption of arsenic from aqueous solution on

synthetic hydrous stannic oxide

Biswaranjan Manna,Uday Chand Ghosh ?

Department of Chemistry,Presidency College,86/1College Street,Kolkata 700073,India Received 25July 2006;received in revised form 22October 2006;accepted 23October 2006

Available online 27October 2006

Abstract

The hydrated stannic oxide (HSO)was synthesized and arsenic adsorption behaviour is reported.HSO is found to be amorphous,and stable thermally up to 700?C.The adsorption of As(III)is much higher than As(V)in the drinking water pH (6.5–8.5)range.The time required for reaching equilibrium is 4.0and 3.0h,respectively for As(III)and As(V).The adsorption kinetic data obtained at pH 7.0(±0.1)and temperature 27(±1)?C follow the pseudo-second-order kinetic model best (R 2>0.98).The analyzes of isotherm adsorption data by two parameter isotherm model equations show the order to obey:Langmuir >Freundlich >Temkin for As(III),and Langmuir >Temkin >Freundlich for As(V).The monolayer adsorption capacities (mg/g)obtained for As(III)and As(V)are 15.85and 4.30,respectively.Excepting phosphate,other anions studied show no adverse effect on adsorption of As(III)onto HSO.A ?xed bed HSO packed column (internal diameter 0.70cm,bed height 3.7cm and particle size 0.14–0.29mm)generates 2400and 450BV of potable water (As <0.01mg/L),respectively,for As(III)and As(V)from arsenic spiked (1.0mg/L)water samples at pH 7.0(±0.1),which indicated that HSO can be used as an ef?cient scavenger for As(III)from the contaminated water.

?2006Elsevier B.V .All rights reserved.

Keywords:Adsorption;Aqueous solution;Arsenic;Hydrous stannic oxide

1.Introduction

Occurrence of arsenic in ground water much exceeding the tolerance limit (10?g/L)is a global problem [1],and posed an ever increasing degree of health hazard.The Bengal delta basin [West Bengal in India and Bangladesh]has become infested with this menace,and in some pockets of this region it has assumed a life-threatening proportion causing deaths of a good number of inhabitants.The arsenic content in ground waters as reported [1]is wide in range (West Bengal in India:<10–3200?g/L,and Bangladesh:<0.5–2500?g/L).The cause of accumulation of arsenic in ground water in this delta region is an anoxic environ-ment around its alluvial deposits of geogenic arsenic pyrites and iron oxyhydroxide with adsorbed arsenic undergoing microbial reduction [2–5].The aquifers thus become rich in this reduced As(III)along with Fe(II).The reported ratios of As(III)/As (Total)at a depth of 30–40m in these aquifers [5]are in the range of

?

Corresponding author.Tel.:+913322413893.E-mail address:ucg@https://www.doczj.com/doc/10522601.html, (U.C.Ghosh).

0.6–0.9.This high ratio is a matter of great concern since As(III)has much greater combining af?nity with the thiol (–SH)group of proteins.

Treatment of arsenic-contaminated ground water by sur-face adsorption method has been found to be simple and cost effective suitable for catering to the needs of this peo-ple of rural areas of third world countries like India and Bangladesh.The adsorbents studied so far are many and include amorphous iron hydroxide [6],hydrous ferric oxide [7],granular ferric hydroxide [8],ferrihydrite [9],red mud [10],activated alumina [11–13],iron oxide coated poly-meric materials [14],iron oxide coated sand [15],Fe(III)–Si binary oxide [16],iron oxide impregnated activated alumina [17],blast furnace slug [18],iron–cerium bimetal oxide [19],iron-coated sponge [20],nano-scale zerovalent iron [21–23],sulfate modi?ed iron oxide-coated sand [24]and hydrous fer-ric oxide incorporated into naturally occurring porous diatomite [25].In our laboratory,we have used crystalline hydrous ferric oxide [26],crystalline hydrous titanium oxide [27],granular hydrous zirconium oxide [28]and iron(III)–tin(IV)binary mixed oxide [29]for arsenic removal.A pilot-scale run

0304-3894/$–see front matter ?2006Elsevier B.V .All rights reserved.doi:10.1016/j.jhazmat.2006.10.066

B.Manna,U.

C.Ghosh/Journal of Hazardous Materials144(2007)522–531523

Nomenclature

a1,a2,b1,b2constants of power function and simple Elovich equation

A,B Temkin constants

b Langmuir constant

BV bed volume

C0initial adsorbate concentration(mg/L)

C e equilibrium adsorbate concentration(mg/L)

C t the concentration(mg/L)of adsorbate at any time,

t

K0constant

K2pseudo-second-order rate constant

K ad pseudo-?rst-order rate constant

K f Freundlich constant

M mass of HSO added(g/L)

n Freundlich constant

pH ZPC zero point surface charge pH

p K a negative logarithm of dissociation constant

q e uptake capacity at equilibrium(mg/g HSO)

q t uptake capacity at time t(mg/g HSO)

R L separation factor

R2correlation coef?cient

V volume of solution(mL)

Greek symbols

αconstant

θ0Langmuir constant(mg/g)

for removal of excess iron and arsenic from contaminated water using manganese dioxide and crystalline hydrous ferric oxide packed columns has also been reported[30]from our laboratory.

Literature survey revealed that there are some adsorbents which have greater af?nity for As(V)than for As(III)both in the acid and drinking water pH range;but hydrous oxides of tetrava-lent metals clearly showed the opposite property as reported from our laboratory[28].Since the underground aquifers at the depth of30–40m in the Bengal delta basin region are reported[5]to contain arsenic mainly as As(III),the objective of the present work is to develop adsorbents for preferen-tial removal of As(III)from water,and offers still a frontier area of research work.As(III)exists as As(OH)3[p K a1=9.2] in the pH range of potable water and is a softer Lewis base than the anionic As(V).Sn(IV)[4s24p64d10]is a softer Lewis acid than either Fe(III)or Ti(IV).So hydrated stannic oxide (HSO)is expected to have greater af?nity for As(III)than for As(V).

With this view,the present paper reports the synthesis, characterization and systematic arsenic adsorption behaviour of hydrous stannic oxide(HSO).Finally,a?xed bed column adsorption test on arsenic removal from water on a lab-bench scale has also been reported.2.Materials and methods

2.1.Preparation of adsorbent

Hydrous stannic oxide(HSO)was prepared by neutraliz-ing0.1M sodium stannate with drop-wise addition of0.1M ammonium chloride solution.The white gel-like precipitate of stannic hydroxide formed was aged for ten days with mother liquor.Decanting the mother liquor,thereafter,the precipitate was washed with de-ionized water till alkali free.The?ltered white mass was dried in an air oven at50–60?C.The dried mass when treated with cold water was broken into?ne particles,and sieved to collect the particles ranged between0.14and0.29mm.

2.2.Arsenic solutions

A standard stock As(III)solution(1000mg/L)was prepared by dissolving0.1320g of As2O3(99.9%Aldrich,USA)in l0mL4%(w/v)NaOH,acidi?ed with2.0mL concentrated HCl and then diluted to100mL with arsenic free de-ionized water.The working solutions of As(III)of desired concentra-tions were made by diluting the stock with0.2%(v/v)HCl.The stock solution was prepared freshly after every three days and frozen to prevent oxidation.The standard stock As(V)solution (1000mg/L)was also prepared by dissolving4.1601g of sodium arsenate(Na2HAsO4,7H2O,E.Mark,Germany)with arsenic free de-ionized water in to a1000mL volumetric?ask.The working solutions of As(V)of a required concentration were made by diluting the stock with de-ionized arsenic free water and frozen.

2.3.Analytical methods

Total arsenic as well as As(III)species was analyzed by hydride generation atomic absorption spectrophotome-ter(Perkin-Elmer-3100)and UV–vis spectrophotometer (HITACHI model-3210).Total dissolved inorganic arsenic in water sample was determined by adding HCl(32%,v/v)and KI (10%,w/v)where As(V)was reduced to trivalent state,which was converted to arsine with3%(w/v)NaBH4.The arsine gas was carried over to the?ame of atomic absorption spectropho-tometer,and absorbance value was noted at193.7nm against blank,and compared with standard for arsenic concentration. As(III)in water sample was determined by selective reduction with3%NaBH4to volatile arsine at pH4.8in acetate buffer.This method allows rapid determination of arsenic species down to 1?g/L with±4%accuracy[31].In spectrophotometric method, the generated arsine gas was adsorbed in silver dietyl dithiocar-bamate(SDDC)(G.R.,E.Marck)solution in chloroform solvent, and absorbance was measured at535nm against blank and com-pared with the standard curve[31].Some common ions,viz., phosphate,sulfate,nitrate,chloride,?uoride and bicarbonate in water sample were estimated by ion-chromatography(IC)using standard method[31].Stannic ion in solution was determined colorimetrically.Here,a de?nite volume(40.0mL)sample solu-tion was concentrated to10.0mL,and used for developing color in dithiol method[32].

524 B.Manna,U.C.Ghosh/Journal of Hazardous Materials144(2007)522–531

X-ray diffraction(XRD)analysis of the synthetic oxide was conducted by the powder method with Philips PW1830gen-erator.Thermo gravimetric(TG)and differential thermal(DT) analyzes of the adsorbent were recorded using a seterm ana-lyzer in argon atmosphere at a heating rate of20?C/min over a temperature range of30–1000?C.Point of zero charge(pH zpc) was determined from electrophoretic mobility(EM)of the oxide using a Zeta-Meter.The electrophoretic mobility of solid sor-bent suspensions containing0.02%solid in0.01(M)NaCl was determined at various pH.Surface area of the sorbent particles was measured by Brunauer–Emmett–Teller(BET)method by adsorption of N2gas at liquid N2temperatures using Micromer-ities high-speed surface analyzer.

2.4.Batch experiments

2.4.1.pH effect

The effect of pH in a range from2to10on arsenic adsorp-tion was conducted by mechanical agitation(250–260rpm)at room temperature,27(±1)?C.Here,0.1g HSO(particle size: 0.14–0.29mm)was added with50.0mL aliquots of As(III)and As(V)solutions(5.0and10.0mg As/L)taking separately in well capped100mL polythene bottles.The required initial pH(pH i) of test solutions were adjusted using0.1(M)HCl and/or0.1(M) NaOH.Agitating the reaction mixtures for5.0h for both As(III) and As(V),the solutions were?ltered using0.45?m membrane ?lter;and analyzed for residual arsenic and equilibrium solution pH(pH f).

2.4.2.Adsorption kinetic studies

Adsorption kinetic experiments were performed by batch method at pH i7.0(±0.1)and room temperature,27(±1)?C. Here,50.0mL solution of arsenic[concentrations(mg/L):5.0 and10.0]was taken in to100mL polythene bottles with0.1g HSO,and agitated(250–260rpm)using a shaker.A pH elec-trode was inserted into the solutions10min before withdrawing of samples for pH measurement,and0.1(M)NaOH or0.1(M) HCl was added,if required,for pH adjustment(~7.0)during experimental run.The reaction mixtures including bottle were withdrawn at a time interval of15min from starting till the equi-librium reached.The?ltered sample solutions were analyzed for arsenic.

2.4.

3.Adsorption isotherm

Adsorption isotherm experiments were conducted at room temperature,27(±1)?C and at pH7.0(±0.1)by batch adsorption procedure as described above.Here,six different concentrations ranging from1.0to10.0mg/L were used sep-arately each for As(III)and As(V).The agitation time and speed used were5.0h and250–260rpm,respectively,for equilibrium. The solution pH was adjusted twice in the middle(after1.0and 4.0h of agitation)using0.1M HCl and/or0.1M NaOH solution. Similar intermediate pH adjustment was made by Jang et al.

[25]for arsenic adsorption isotherm experiment using250rpm shaking speed.Residual arsenic was determined in the?ltered sample.2.4.4.Column test

The glass columns(internal diameter:0.70cm)were packed with HSO(particle size:0.14–0.29mm,pH~7.0)up to a height of3.7cm.The laboratory tap water of Presidency College(PC) was spiked with As(III)and As(V)separately up to a level of 1.0mg/L.The tap water used for sample preparation was the ground water of PC.The tap water composition[27]was found to be almost the representative of the?eld samples of arsenic-contaminated belt of West Bengal in India.The arsenic spiked PC tap water samples were passed with a down?ow(?ow rate:~100mL/h;contact time:~35s)direction to evaluate column ef?ciency for As(III)and As(V)removal.

3.Results and discussions

3.1.Physico-chemical characteristics of HSO

The X-ray diffraction analysis showed that the synthesized hydrous stannic oxide(HSO)was of amorphous variety.The thermal stability of the hydrous oxide is shown in Fig.1.Thermo gravimetric(TG)analysis recorded8.26%and6.81%weight loss in drying temperature range below190and190–700?C, respectively.The weight loss below and above190?C corre-sponds to dehydration and phase transition of the oxide.The calculated weight loss of4.22%on drying up to110?C was attributed to the irreversible loss of physically adsorbed water molecules,and that would be the moisture content of the hydrous oxide.This is con?rmed from a broad endoergic DTA peak (Fig.1)at110?C.The differential thermal analysis(DTA) showed no exoergic peak(Fig.1),so the chemical reactions,viz., polymerizations or crystallizations did not take place on drying up to700?C.Electrophoretic mobility studies of the oxide sus-pensions at various pH values showed that pH ZPC of the synthetic oxide was4.6to6.4.The wide range of pH zpc value of HSO is presumably owing to the lower basicity of tin(IV).Thus,HSO could be a surface-active oxide.The anion and cation exchange properties of HSO were also reported[33]at pH below4.6and above6.4,

respectively.

Fig.1.Thermo gravimetric and differential thermal analysis of HSO.

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C.Ghosh/Journal of Hazardous Materials144(2007)522–531

525

Fig.2.(a)Effect of initial pH on arsenic adsorption by HSO at27(±1)?C and (b)the plot of equilibrium pH(pH f)vs.initial pH(pH i).

Some determined physico-chemical characteristics of HSO are:nature:amorphous;metal content:61.60%;moisture con-tent:4.22%;bulk density:1.38g/cm3;particle size:0.14to 0.29mm;surface area:140.8m2/g;pH zpc:4.6–6.4;solubility (pH6.5–8.0)=0.02mg/L.

3.2.Effect of pH

The effect of initial pH(pH i)on adsorption of arsenic was determined by loading5.0mg As/g of adsorbent in the pH i range of2.0–10.0and at temperature27(±1)?C.Fig.2a demonstrates the ef?ciency of arsenic removal,and shows the increase in adsorption capacity(q e,mg/g)for As(III)with increasing pH i from2.0to6.0,that remained almost same in the pH i range6.0to8.0while that for As(V)decreased with increasing pH i from2.0to10.0.In general,the adsorp-tion of As(III)is less pH dependent,while that of As(V) is highly pH dependent.The determined q e-value for As(V) was signi?cantly greater than As(III)at pH i2.0,while that for As(III)was clearly greater than As(V)at pH i>3.0.Results (Fig.2a)show that the percentage of As(V)adsorption was found to be about12.0to13.0%of As(III)at pH i10.0. Additionally,the equilibrium solution pH(pH f)was found to increase(Fig.2b)somewhat more for As(V)adsorption onto the HSO than the increase found for As(III)in the pH i-range of 2.0–8.0.

The lower adsorption capacity for As(III)than As(V)of HSO

at pH i2.0is due to the electrostatic hindrance between posi-

tive surface sites of the adsorbent[pH zpc=4.6to6.4]and H?+

center of OH groups in As(OH)3[p K a1=9.2].For As(V),the

positive surface sites of the adsorbent attracts the anionic adsor-

bate species[p K a1=2.6and p K a2=6.4of H3AsO4],and the

adsorption capacity is high.With increasing pH i,the positive

charge density of adsorbent surface decreases and,therefore,

the adsorption of non-ionic As(III)increases due to decrease

in electrostatic hindrance while that of As(V)decreases due to

decreasing electrostatic attraction.At pH i~6.0,HSO surfaces are to be negative and the As(V)anion being repelled due to

like nature of charge,and the adsorption capacity for As(V)

is about50%less than that obtained at pH i5.0.In contrast,

that decrease for As(III)adsorption was not found,because

the earlier noted adsorptive force persists up to pH i8.0.At

pH i>8.0,the less adsorption capacity of adsorbate ions are obvi-

ously due to(i)increase in electrostatic hindrance between like

charges on adsorbent and adsorbate,and(ii)increase in compet-

ing OH?concentration for sorption sites.Thus,the adsorption

of As(III)and As(V)onto HSO takes place with different

mechanisms.

The high value of As(III)adsorption data in the pH i range

of4.0–8.0resembled closely to our earlier studies[26,28].

The present observation on As(III)adsorption is similar to

the literature available reports made by other workers using

different adsorbents[6,14,16].However,the pH i value for max-

imum As(V)adsorption differ from the reports made by others

[11,16,26].The lower pH i value for high arsenic adsorption

compared to other literature available data may be due to the

presence of4d10con?guration in valence shell of the metal ion

in HSO.The mechanisms for As(III)and As(V)adsorption are

similar to that reported by others.In addition,As(V)adsorption

at pH i≤6.0can be attributed by ligand(or anion)exchange[33] phenomenon.This supports the increase in pH of equilibrium solution.

Sn–OH(s)+?O–AsO(OH)2(aq)+H+

Sn+–?OAsO(OH)2(s)+H2O(1)

The adsorption capacity for As(V)was very high at pH i 2.0despite some solubilization loss of the HSO(0.03mg/L) at that pH i,because the anion-exchange property increases with decreasing pH.The high adsorption capacity of HSO for As(III) may be due to soft Lewis acid–base type interaction.,where SnO2·x H2O(Sn4+,a4d10species)functions as soft Lewis acid and As(OH)3a soft Lewis base,giving a surface complex. Other workers,however,have earlier reported the probability of surface complex formation without specifying the stabilizing interaction.

SnOH(s)+As(OH)3 HO–Sn–As(OH)3(s)(2)

where SnOH(s)stands for solid HSO in noted two adsorption reactions(Eqs.(1)and(2))for mechanisms.

526 B.Manna,U.C.Ghosh/Journal of Hazardous Materials144(2007)

522–531

Fig.3.Effect of drying temperature of adsorbent on As(III)adsorption at pH 7.0(±0.1).

3.3.Effect of drying temperature

The synthetic HSO was dried for an hour at the temper-atures25,50,100,150and200?C separately,and used for As(III)adsorption.Results(Fig.3)show a small increase in adsorption capacity of As(III)when the drying temperature was increased from25to50?C,and that,thereafter,decreased slowly with increasing drying temperature of adsorbent.This indicates the increase of surface active sites for As(III)adsorption with increasing drying temperature from25to50?C which is due to the loss of physically attached(H-bonded)water molecules from the surface and,increases availability of surface active OH groups for arsenic adsorption.The decrease in adsorption capac-ity with increasing temperature for drying above50?C is due to the loss of surface active OH sites as water which agrees well with the loss of weight in thermal analysis(Fig.1).Simi-lar results were reported for As(III)adsorption using crystalline hydrous titanium oxide[27].In contrast,crystalline hydrous fer-ric oxide showed an increase in arsenic adsorption capacity with increasing temperature for drying up to300?C[26].Thus,it can be suggested that HSO,dried at50?C,could be used for As(III) removal.

3.4.Kinetic modeling

Fig.4a and b show the time dependent arsenic adsorption data at pH7.0(±0.1)and temperature27(±1)?C.For the ini-tial arsenic loads2.5and5.0mg per g adsorbent,the adsorption capacities(mg/g)nearly obtained were1.80and3.33,2.30and 3.96,and2.49and4.26for As(III);and those were0.47and 0.74,0.56and1.00,and0.68and1.09for As(V),respectively, at1,2and4h of contact.The results show that the initial rate of adsorption was fairly rapid for both As(III)and As(V).~70% of the adsorbed amount took place in an hour of agitation and, the remaining~30%adsorption took place taking additional3.0 and2.0h.That is,the time required for reaching adsorption equi-librium was4h for As(III),while that was3h for As(V).Results show(Fig.4a and b)that the adsorption of As(V)onto HSO is faster than As(III)which is similar to the observation reported by Raven et al.[9].However,the equilibrium time obtained

in Fig.4.Adsorption kinetic data for:(a)As(III)at pH7.0(±0.1)and at27(±1)?C and(b)As(V)at pH7.0(±0.1)and at27(±1)?C.

the present case is found to be less compared to the studies made using some other oxides[26,27].

The data shown in Fig.4a and b are used for analysis taking the linear form of the following kinetic model equations: The pseudo-?rst-order equation[34]:

log(q e?q t)=log q e?

K ad

2.303

t(3)

where q e and q t are the adsorption capacity(mg/g)at equilibrium and at time,t,respectively;and K ad the pseudo-?rst-order rate constant(time?1).

The pseudo-second-order equation[35]:

t

t

=

1

2e

+

1

e

t(4)

where both q e and q t have the same meaning as above.K2is the pseudo-second-order rate constant(g mg?1time?1).

The Bhattacharya–Venkobachar equation[36]:

ln(1?U(t))=K B t(5) where U(t)=C0?C t/C0?C e,where C0,C t and C e are the con-centrations(mg/L)at t=0,t and equilibrium,respectively.

The power function equation[37]:

log q t=log a1+b1log t(6) where a1and b1are some constants,q t the adsorption capacity (mg/g)at time,t.

The Elovich equation[38]:

q t=βln(αβ)+βln t=a2+b2ln t(7)

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527

Fig.5.Pseudo-second-order plot of:(a)As(III)adsorption at pH7.0(±0.1)and at27(±1)?C and(b)As(V)adsorption on HSO at pH7.0(±0.1)and at27 (±1)?C.

whereαandβhave usual signi?cation of the model equation, and a2=βln(αβ)and b2=β.

The estimated kinetic models and related parameters with linear regression coef?cient(R2)are shown in Table1.The present kinetic adsorption data for both As(III)and As(V)on HSO describe the pseudo-second-order model(Fig.5a and b)best(0.98

3.5.Intra-particle(pore)diffusion

The adsorption process onto an adsorbent follows three steps, viz.,?lm diffusion,macro and micro-pore diffusions phenom-ena.The slowest of the three-step controls the overall rate pro-cess.Generally,intra-particle(pore)diffusion is the rate-limiting step in batch process,while for a continuous?ow system?lm diffusion is more likely to be the rate-limiting step.The intra-particle(pore)diffusion rate constant(k i)can be de?ned as the gradient of the plot of sorption density versus square root of time [39,40].The plot of q t versus t1/2was found to be linear for a wide range of contact time for arsenic sorption indicating the presence of external mass transfer(Fig.6).It shows three separate regions: initial part of the curve is attributed to mass transfer[41](slope k1)taking place with boundary layer(?lm)diffusion,while the?nal linear portion(s)of the curve indicate intra-particle diffusion(slope k2and k3).The values of k2and k3indicate that the pores are micropore and intra-particle diffusional resis-tance is due the micro pores only which is more pronounced for large As(V)compared to small As(III)species.This is evident from smaller values of k2and k3for As(V).Moreover,pore sorption of As(III)and As(V)are concentration dependent and

Table1

Adsorption kinetic model equations with different parameters evaluated on adsorption of arsenic by HSO at pH7.0(±0.1)and at27(±1)?C

Adsorption kinetic model equations Parameters Initial As(III)loads

(mg/g of adsorbent)Initial As(V)loads (mg/g of adsorbent)

2.5 5.0 2.55.0

Pseudo-?rst order:

log(q e?q t)=log q e?K ad/2.303t K ad×102(min?1) 1.36 1.49 1.75 3.09 R20.97820.98220.97190.9723

Pseudo-second-order:t/q t=1/K2q2e+t/q e K2×102(g/(mg min)?1) 1.35 1.16 2.63 1.20 R20.99900.99910.99600.9804

Bhattacharya–Venkobachar:

ln(1?U(t))=K B t;U(t)=C0?C t/C0?C e K B(min?1)×102 1.50 1.360.20 1.88 R20.98110.87980.85220.9559

Power function:

log q t=log a1+b1log t a10.4533 1.34780.05990.0432 b10.32840.21160.47760.6286 R20.90650.98110.91570.9098

Simple Elovich: q t=a2+b2ln t a2?0.41810.4402?0.2635?0.7072 b20.54670.70670.17800.3383 R20.95820.99190.99320.9210

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522–531

Fig.6.Intra-particle diffusion rate constants (k i ,mg g ?1min ?1/2)of arsenic adsorption at pH 7.0(±0.1)and at 27(±1)?C.

the rate of pore diffusion increases with increasing concentra-tion.

The Bangham’s equation,furthermore,as suggested by Aha-roni and Ungarish [42](Eq.(8))has been applied for verifying the pore-controlled adsorption phenomena,log log C 0C 0?q t m =log K 0m 2.303V

+αlog t (8)

where C 0is the initial As(III)concentration (mg/L),V the volume of solution (mL),m the mass of adsorbent (g/L),q t the amount of adsorbate retained in solid at time t ,αand K 0are con-stant.The plots of log(log C 0)/(C 0?q t m )versus log t (Fig.7a and b)obtained for As(III)and As(V)adsorption data show better correlation coef?cient values for As(III)(R 2=0.97–0.99)than for As(V)(R 2=0.73–0.75).This supports the previous conclusion that the adsorption kinetics for the As(III)is more pore-diffusion controlled than As(V).This is presumably due to larger size of As(V)than As(III)in aqueous solution that hindered to enter into the pore.3.6.Isotherm envelope

Fig.8a and b show the equilibrium isotherm data for arsenic at pH 7.0(±0.1)and temperature 27(±1)?C.The following linear isotherm model equations are used for analyzing the equilibrium adsorption data of As(III)onto HSO:

Freundlich equation [43]:q e =k f C 1/n

e .The linear from o

f the equation is:lo

g q e =log K f +

1

n

log C e (9)

Langmuir equation [44]:q e =(θ0bC e )/(1+bC e ).The linear from of the equation applied for isotherm data analysis is:1q e =1θ0bC e +1θ0

(10)

Fig.7.Pore diffusion controlled adsorption kinetics of:(a)As(III)at pH 7.0(±0.1)and at 27(±1)?C and (b)As(V)at pH 7.0(±0.1)and at 27(±1)?C.

The Temkin isotherm equation applied for isotherm analysis in the following form [45]:q e =A +B log C e

(11)

Fig.8.Equilibrium isotherm data for:(a)As(III)adsorption at pH 7.0(±0.1)

and 27(±1)?C and (b)As(V)adsorption at pH 7.0(±0.1)and 27(±1)?C.

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C.Ghosh/Journal of Hazardous Materials144(2007)522–531529

Table2

Estimated isotherm parameters for As(III)-sorption onto HSO at pH7.0(±0.1) and at27(±1)?C

Estimated isotherm parameters

As(III)As(V)

Langmuir

R20.98500.9707

θ0(mg/g)15.850 4.303

b(L/mg)0.27270.0488

Freundlich

R20.97200.8935

K f 3.5480.1521

n 1.569 1.0739

Temkin

R20.80690.9553

A 4.2472?0.928

B 4.9862 2.4739

where q e is the amount adsorbed at equilibrium(mg/g)and C e the equilibrium concentration of adsorbate in solution(mg/L), K f and n are the Freundlich constants corresponding to adsorp-tion capacity and adsorption intensity,respectively;θ0and b are Langmuir constants related to maximum monolayer capac-ity and energy of adsorption,respectively;A and B are Temkin constants.

The isotherm parameters and linear regression coef?cient (R2)values obtained from the linear plots are shown in Table2. The best-?t plots are shown in Fig.8a and b.The results (Table2)obtained from the isotherm analysis indicated that the Langmuir model describes the As(III)and As(V)adsorp-tion isotherm data onto HSO best.The R2values were of0.9850 and0.9707for As(III)and As(V),respectively.The order of?t-ting of the present data with the two parameter isotherm models is:Langmuir>Freundlich>Temkin for As(III),and Lang-muir>Temkin>Freundlich for As(V).The Langmuir isotherm model describes the adsorption data for As(III)better than for As(V).Similar order on the?tting of the As(III)adsorption data was reported by Zeng[16]and Raven et al.[9]at pH6.5and 9.2,respectively.The better?t of As(III)adsorption data with the Langmuir isotherm was reported earlier[27,28].The different trend found in describing the adsorption data with two-parameter isotherm models suggests different adsorption mechanisms for As(III)and As(V)adsorption onto HSO(Fig.9).

The evaluated values for mono-layer adsorption capacity(θ0) and adsorption energy(b)from the Langmuir isotherm plots show(Table2)that the values for As(III)are much higher than for As(V).The higher values of the Freundlich and Temkin con-stants for As(III)compared to As(V)also support the fact that HSO has much greater af?nity for the lower valent species at pH 7.0(±0.1).This agreed well to the results(Fig.2a)obtained in the studies of pH effect.

Despite well-?t of adsorption data with used three different isotherm models,yet it can not high light the mechanis-tic implications.However,the dimensionless parameter,R L [=1/(1+C0b)][46],where b is the Langmuir constant and C0 is the initial adsorbate concentration,can predict whether

the https://www.doczj.com/doc/10522601.html,ngmuir isotherm plot of:(a)As(III)at pH7.0(±0.1)and at27(±1)?C and(b)As(V)at pH7.0(±0.1)and at27(±1)?C.

adsorption is favorable or unfavorable.The calculated R L-values for a range of initial concentrations(1.0–20.0mg/L)of adsor-bates are found to lie between0and1.0,and indicate the favorable adsorption of both arsenic species onto HSO at pH 7.0(±0.1).The R L-values for As(III)are found always lower than those for As(V)suggested the more adsorption favorability of the reduced arsenic compared to that of the oxidized species.

3.7.Adverse effect of some anions

The adverse effect of some anions(commonly found in groundwater)on As(III)adsorption onto the adsorbent were studied in the pH range5.0–8.0.The studied sulfate,nitrate, chloride and?uoride ions show no signi?cant interference while phosphate ion shows(Fig.10)notable effect on As(III)-adsorption,particularly at higher phosphate concentrations.The arsenic(III)removal was found to decrease from87.86to

79.30%

Fig.10.Effect of phosphate on As(III)adsorption by HSO.

530 B.Manna,U.C.Ghosh/Journal of Hazardous Materials144(2007)

522–531

Fig.11.As(III)and As(V)in ef?uent of HSO column.

at pH5.0,and84.52to67.50%at pH8.0,when the mole ratio of PO43?:As(III)was increased from0.662to2.648.The phos-phate mass balance for these experiments con?rmed that the PO43?ions adsorbed but barely on HSO probably through the formation of surface complexes with surface hydroxyl groups [47,48]reported similar signi?cant adverse effect of phosphate on As(III)adsorption onto ferrihydrite.This indicates that the adsorbent,HSO can be used ef?ciently for As(III)removal from contaminated groundwater when phosphate concentration in that water is low.

3.8.Column study

The results(Fig.11)obtained on the arsenic removal using ?xed bed adsorbent columns show that the break-through and exhaustion point(10?g/L As in ef?uent)for As(V)were120 and450bed volumes(BV),while those for As(III)were400and 2400BV,respectively.The early attainment of break-through as well as exhaustion point clearly supported the obtained results that HSO has strong af?nity for As(III)compared to that of As(V)in the drinking water pH range,and HSO can be used effectively in removing predominated As(III)species of the con-taminated ground water of Bengal delta basin.In contrast,Joshi and Chaudhuri[49]reported that iron oxide coated sand removes both As(III)and As(V)with almost equal ef?ciency;and a simple?xed bed unit was treated about160–190BV of water containing1000?g/L arsenite and150–165BV of water with 1000?g/L arsenate.Clifford[50]obtained300and2300BV of treated waters up to the As(III)and As(V)level of<10?g/L from the in?uent(As(III)and As(V)concentration:100?g/L)water separately using activated alumina column at https://www.doczj.com/doc/10522601.html,par-ing the present results with the results reported by Joshi and Chaudhuri[49]and also by Clifford[50]have revealed that HSO is a better adsorbent for scavenging As(III)for the con-taminated ground water treatment of Bengal delta basin of the river‘Ganga’.

3.9.Cost estimation of HSO

The cost(per kg)of raw materials used was~$6.0(for ordinary sodium stannate)and~$2.5(for ordinary ammonium chloride).Adding10%additional with the above cost,the cost for the preparation of HSO is~$9.35.This cost could be reduced up to50%if sodium stannate be prepared from waste metallic tin materials.

4.Conclusion

Hydrous stannic oxide(HSO),an amorphous variety,showed greater adsorption af?nity for the As(III)than for As(V).The adsorption of As(III)was found almost pH insensitive,and maximum adsorption took place in the pH range of3.0–8.0, whereas that of As(V)was highly pH sensitive and maximum adsorption took place at pH<3.0.There is a small change of As(III)-adsorption when HSO used was pre-dried up to the temperature of200?C.The adsorption kinetic data for As(III) and As(V)at pH7.0(±0.1)and at temperature27(±1)?C described the pseudo-second-order kinetic equation best.The As(III)and As(V)-adsorption equilibrium reached in4.0and 3.0h,respectively,and adsorption isotherm data described the Langmuir isotherm model best.The competing ions,viz.,sul-fate,nitrate,chloride and?uoride showed no adverse effect on As(III)-adsorption up to their permissible concentration levels in groundwater whereas the phosphate ion showed a signi?-cant interference on As(III)-adsorption in the drinking water pH range.A?xed bed HSO column was produced2400and450BV of potable water(As content<0.01mg/L)for As(III)and As(V), respectively from the contaminated water(1.0mg As/L).Thus, HSO can be used as an ef?cient adsorbent for more toxic and prevalent As(III)species from groundwater. Acknowledgement

We are thankful to the Head,Department of Chemistry,Presi-dency College,Kolkata,India for providing laboratory facilities. References

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控制软件说明书

控制软件说明书 PC端软件FTM 安装及应用 系统运行环境: 操作系统中英文Windows 98/2000/ NT/XP/WIN7/ Vista, 最低配置 CPU:奔腾133Mhz 内存:128MB 显示卡:标准VGA,256色显示模式以上 硬盘:典型安装 10M 串行通讯口:标准RS232通讯接口或其兼容型号。 其它设备:鼠标器 开始系统 系统运行前,确保下列连线正常: 1:运行本软件的计算机的RS232线已正确连接至控制器。 2:相关控制器的信号线,电源线已连接正确; 系统运行步骤: 1:打开控制器电源,控制电源指示灯将亮起。 绿色,代表处于开机运行状态;橙色代表待机状态。 2. 运行本软件 找到控制软件文件夹,点击FWM.exe运行。出现程序操作界面:

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门禁考勤管理软件 使 用 说 明 书

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一.系统介绍―――――――――――――――――――――――――――――2二.软件的安装――――――――――――――――――――――――――――2 三.基本信息设置―――――――――――――――――――――――――――2 1)部门班组设置―――――――――――――――――――――――――3 2)人员资料管理―――――――――――――――――――――――――3 3)数据库维护――――――――――――――――――――――――――3 4)用户管理―――――――――――――――――――――――――――3 四.门禁管理―――――――――――――――――――――――――――――4 1)通迅端口设置―――――――――――――――――――――――――42)控制器管理――――――――――――――――――――――――――43)控制器设置――――――――――――――――――――――――――64)卡片资料管理―――――――――――――――――――――――――11 5)卡片领用注册―――――――――――――――――――――――――126)实时监控―――――――――――――――――――――――――――13 五.数据采集与事件查询――――――――――――――――――――――――13 六.考勤管理―――――――――――――――――――――――――――――14 1)班次信息设置――――――――――――――――――――――――――14 2)考勤参数设置――――――――――――――――――――――――――15 3)考勤排班――――――――――――――――――――――――――――15 4)节假日登记―――――――――――――――――――――――――――16 5)调休日期登记――――――――――――――――――――――――――16 6)请假/待料登记―――――――――――――――――――――――――17 7)原始数据修改――――――――――――――――――――――――――17 8)考勤数据处理分析――――――――――――――――――――――――17 9)考勤数据汇总―――――――—――――――――――――――――――18 10)考勤明细表—―――――――――――――――――――――――――18 11)考勤汇总表――――――――――――――――――――――――――18 12)日打卡查询――――――――――――――――――――――――――18 13)补卡记录查询—――――――――――――――――――――――――19

(完整版)the的用法

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常见问题 一、如何作废“代收缴款书” 日常业务——代收缴款书——缴款——删除“专用票据号”和“缴款日期”——保存——作废。 二、上报核销时出现欠缴金额,无法完成核销,或提示多缴。 1、首先检查有没有选择好截止日期,选择好后有没有点击“刷新”。 2、其次检查有没有做代收缴款书。注意:最后一张缴款书的日期不得晚于选择上报核 销日期。 3、若上述方法仍无效,则可能是由于以前作废过票据而未作废缴款书。解决方法: 首先作废若干张缴款书(直到不能作废为止),然后重新做一张新的缴款书。再核销。 三、打开“博思开票”时,出现“windows socket error:由于目标机器积极拒绝,无法连接。 (10061),on API’connect’” 单击“确定”,将最下面一行的连接类型“SOCKET”更换为“DCOM”,再点“连接” 即可。 四、如何设置密码 双击桌面“博思开票”,单击登录界面的右下方“改口令”输入用户编号、新密码和确认密码,单击“确认”即可。 五、更换开票人名称或增加开票人 进入开票系统——系统维护——权限管理 1、更换开票人名称:单击“用户编码”——删除“用户名”——输入新的开票人名称 ——单击“保存用户”即可。 2、增加开票人:单击“新增用户”——输入“用户编码”和“用户名”——单击“保 存用户”——单击新增的用户编码——将右边的“权限列表如下”下面的“所有”前的小方框勾上——单击右侧“保存用户权限”。 六、重装电脑系统 1、由于博思开票软件安装在D盘,所以重装电脑系统前无需做任何备份。 2、重装系统后,打开我的电脑—D盘,将“博思软件”文件夹复制到桌面上(或U盘)。 3、将安装时预留的安装光盘放入主机,打开后找到“票据核销及管理_开票端(江西欠 缴不能上报版)”(或者进入D盘----开票软件备份目录勿删文件夹里也可找到)。双 击,按提示点击“下一步”,直到“完成”。 4、双击桌面任务栏右下角“博思开票服务器”,将其关闭(或右键点击“博思开票服 务器”——“关闭服务器”)。 (这一步若找不到“博思开票服务器”,也可以用重启电脑来代替) 5、将刚才复制到桌面(或U盘)的“博思软件”再复制粘贴回D盘,若提示“此文 件夹已包含名为博思软件的文件夹”,点击下面的“全部”。 6、双击桌面“博思开票”——输入用户编码(001)——确定。 7、确认原来的票据数据没有丢失后,将桌面(或U盘)的“博思软件”文件夹删除。

控制系统使用说明

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2、放空阀全开:放空阀指示为0% 3、润滑油压正常 4、润滑油温正常 5、动力油压正常 6、逆止阀全关 7、存储器复位:按下存储器复位按钮,即可复位,若复位不成 需查看停机画面。 8、试验开关复位:按下试验开关按钮即可,试验开关按钮在风 机启动后,将自动消失,同时试验开关也自动复位。 当以上条件达到时,按下“允许机组启动”按钮,这时机组允许启动指示变为红色,PLC机柜里的“1KA”继电器将导通。机组允许启动信号传到高压柜,等待电机启动。开始进行高压合闸操作,主电机运转,主电机运转稳定后,屏幕上主电机运行指示变红。这时静叶释放按钮变红,按下静叶释放按钮后,静叶从14度开到22度,静叶释放成功指示变红。 应继续观察风机已平稳运行后,按下自动操作按钮,启机过程结束。 B、停机画面: 停机是指极有可能对风机产生巨大危害的下列条件成立时,PLC 会让电机停止运转: 1、风机轴位移过大

“the way+从句”结构的意义及用法

“theway+从句”结构的意义及用法 首先让我们来看下面这个句子: Read the followingpassageand talkabout it wi th your classmates.Try totell whatyou think of Tom and ofthe way the childrentreated him. 在这个句子中,the way是先行词,后面是省略了关系副词that或in which的定语从句。 下面我们将叙述“the way+从句”结构的用法。 1.the way之后,引导定语从句的关系词是that而不是how,因此,<<现代英语惯用法词典>>中所给出的下面两个句子是错误的:This is thewayhowithappened. This is the way how he always treats me. 2.在正式语体中,that可被in which所代替;在非正式语体中,that则往往省略。由此我们得到theway后接定语从句时的三种模式:1) the way+that-从句2)the way +in which-从句3) the way +从句 例如:The way(in which ,that) thesecomrade slookatproblems is wrong.这些同志看问题的方法

不对。 Theway(that ,in which)you’re doingit is comple tely crazy.你这么个干法,简直发疯。 Weadmired him for theway inwhich he facesdifficulties. Wallace and Darwingreed on the way inwhi ch different forms of life had begun.华莱士和达尔文对不同类型的生物是如何起源的持相同的观点。 This is the way(that) hedid it. I likedthe way(that) sheorganized the meeting. 3.theway(that)有时可以与how(作“如何”解)通用。例如: That’s the way(that) shespoke. = That’s how shespoke.

用友T+软件系统操作手册范本

用 友 T+ 软 件 系 统 操 作 手 册版本号:v1.0

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一、系统登录 1.1、下载T+浏览器 首次登陆需要用浏览器打开软件地址,即:127.0.0.1:8000(一般服务器默认设置,具体登陆地址请参考实际配置),第一次登陆会提示下载T+浏览器,按照提示下载安装T+浏览器,然后打开T+浏览器,输入软件登陆地址。 ,T+浏览器, 1.2、软件登陆 按键盘上的“回车键(enter)”打开软件登陆页面,如下: 选择选择“普通用户”,输入软件工程师分配的用户名和密码,选择对应的账套,以下以demo 为例,如下图:

点击登陆,进入软件,

二、基础档案设置 2.1、部门、人员档案设置 新增的部门或者人员在系统中可按照如下方法进行维护,

2.2、往来单位设置 供应商客户档案的添加方法如下: 添加往来单位分类: 2.3、会计科目及结算方式设置会计科目:

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6.3显示屏出现拖尾现象,显示屏的后面出现闪烁不稳定 (29) 6.4注意事项 (31) 6.5显示屏花屏 (31) 6.6错列现象 (32) 6.7杂点现象 (32) 第一章概述 1.1LED-ECS编辑控制系统介绍 LED-ECS编辑控制系统,是一款专门用于LED图文控制卡的配套软件。其具有功能齐全,界面直观,操作简单、方便等优点。自发布以来,受到了广大用户的一致好评。 1.2运行环境 ?操作系统 中英文Windows/2000/NT/XP ?硬件配置 CPU:奔腾600MHz以上 内存:128M 第二章安装卸载 2.1LED-ECS编辑控制系统》软件安装很简单,操作如下:双击“LED-ECS编辑控制系统”安装程序,即可弹出安装界面,如图2-1开始安装。如图所示 图2-1 单击“下一步”进入选择安装路径界面,如图2-2,如果对此不了解使用默认安装路径即可 图2-2 图2-3 单击“完成”,完成安装过程。 2.2软件卸载如图2-2 《LED-ECS编辑控制系统V5.2》提供了自动卸载功能,使您可以方便的删除《LED-ECS编辑控制系统V5.2》的所有文件、程序组件和快捷方式。用户可以在“LED-ECS编辑控制系统V5.2”组中选择“卸载LED-ECS编辑控制系统V5.2”卸载程序。也可以在“控制面板”中选择“添加/删除程序”快速卸载。卸载程序界面如图2-4,此时选择自动选项即可卸载所有文件、程序组和快捷方式。 图2-4 第三章、软件介绍

way 用法

表示“方式”、“方法”,注意以下用法: 1.表示用某种方法或按某种方式,通常用介词in(此介词有时可省略)。如: Do it (in) your own way. 按你自己的方法做吧。 Please do not talk (in) that way. 请不要那样说。 2.表示做某事的方式或方法,其后可接不定式或of doing sth。 如: It’s the best way of studying [to study] English. 这是学习英语的最好方法。 There are different ways to do [of doing] it. 做这事有不同的办法。 3.其后通常可直接跟一个定语从句(不用任何引导词),也可跟由that 或in which 引导的定语从句,但是其后的从句不能由how 来引导。如: 我不喜欢他说话的态度。 正:I don’t like the way he spoke. 正:I don’t like the way that he spoke. 正:I don’t like the way in which he spoke. 误:I don’t like the way how he spoke. 4.注意以下各句the way 的用法: That’s the way (=how) he spoke. 那就是他说话的方式。 Nobody else loves you the way(=as) I do. 没有人像我这样爱你。 The way (=According as) you are studying now, you won’tmake much progress. 根据你现在学习情况来看,你不会有多大的进步。 2007年陕西省高考英语中有这样一道单项填空题: ——I think he is taking an active part insocial work. ——I agree with you_____. A、in a way B、on the way C、by the way D、in the way 此题答案选A。要想弄清为什么选A,而不选其他几项,则要弄清选项中含way的四个短语的不同意义和用法,下面我们就对此作一归纳和小结。 一、in a way的用法 表示:在一定程度上,从某方面说。如: In a way he was right.在某种程度上他是对的。注:in a way也可说成in one way。 二、on the way的用法 1、表示:即将来(去),就要来(去)。如: Spring is on the way.春天快到了。 I'd better be on my way soon.我最好还是快点儿走。 Radio forecasts said a sixth-grade wind was on the way.无线电预报说将有六级大风。 2、表示:在路上,在行进中。如: He stopped for breakfast on the way.他中途停下吃早点。 We had some good laughs on the way.我们在路上好好笑了一阵子。 3、表示:(婴儿)尚未出生。如: She has two children with another one on the way.她有两个孩子,现在还怀着一个。 She's got five children,and another one is on the way.她已经有5个孩子了,另一个又快生了。 三、by the way的用法

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目录 1.概述 业务流程 流程说明:

1.单位到财政部门申请电子票据,由财政把单位的基本信息设置好并审核完后,财政部门给用票单位发放票据,单位进行领票确认并入库。 2.在规定时间内,单位要把开据的发票带到财政核销,然后由财政进行审核。 系统登录 登入系统界面如图: 登录日期:自动读取主服务器的日期。 所属区划:选择单位所属区划编码。【00安徽省非税收入征收管理局】 所属单位:输入单位编码。 用户编码:登录单位的用户编码【002】 用户密码:默认单位密码为【123456】 验证码:当输入错误时,会自动换一张验证码图片; 记录用户编码:勾选系统自动把用户编码保存在本地,第二次登录不需要重新输入。 填写完正确信息,点【确定】即可登入系统。 进入系统 进入系统界面如图: 当单位端票据出现变动的时候,如财政或上级直管下发票据时,才会出现此界面:

出现此界面后点击最下方的确认按钮,入库完成。 当单位端票据无变动时,直接进入界面: 2.基本编码人员管理 功能说明:对单位开票人员维护,修改开票人名称。 密码管理 修改开票人员密码,重置等操作。 收发信息 查看财政部门相关通知等。

3.日常业务 电脑开票 功能说明:是用于开票据类型为电子化的票据。 在电脑开票操作界面,点击工具栏中的【增加】按钮,系统会弹出核对票号提示框,如图: 注意:必须核对放入打印机中的票据类型、号码是否和电脑中显示的一致,如果不一致打印出来的票据为无效票据,核对完后,输入缴款人或缴款单位和收费项目等信息,全部输入完后,点【增加】按钮进行保存当前票据信息或点【打印】按钮进行保存当前票据信息并把当前的票据信息打印出来;点电脑开票操作界面工具栏中的【退出】则不保存。 在票据类型下拉单框中选择所要开票的票据类型,再点【增加】进行开票。

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结算方式,如下: 三、软件操作 、凭证处理 填制 进入总账填制凭证菜单,增加凭证,填制摘要和科目,注意有辅助核算的会计科目, 以下为点开总账的处理流程图: 如若现金流量系统指定错误,可按照以下步骤修改: 凭证在没有审核时,可以直接在当前凭证上修改,然后点击“保存”完成修改; 凭证审核 进入总审核凭证菜单下,如下图: 选择审核凭证的会计期间: 、凭证记账 进入凭证菜单下的记账菜单, 、月末结转 期间损益结转 四、日常帐表查询与统计 、余额表 用于查询统计各级科目的本期发生额、累计发生额和余额等。传统的总账,是以总账科目分页设账,而余额表则可输出某月或某几个月的所有总账科目或明细科目的期初余额、本期发生额、累计发生额、期末余额,在实行计算机记账后,我们建议用户用余额表代替总账。

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温馨提示:: 温馨提示 ◆为了您和设备的安全,请您在使用设备前务必仔细阅读产品说明书。 ◆如果在使用过程中遇到疑问,请首先阅读本说明书。 正文中有设备操作的详细描述,请按书中介绍规范操作。 如仍有疑问,请联系我们,我们尽快给您满意的答复。 ◆本说明书如有版本变动,恕不另行通知,敬请见谅!

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图2 2.选择键,进入下一界面如图3 图3 3.选中项,再按键,进入下一界面如图4

图4 4.选择键,进入下一界面如图5 图5 5.选中项,再选择键,进入下一界面如图6

图6 6.选择键,进入下一界面如图7 图8 7.选择键,软件安装完成 二软件操作 选择WINDOWS 下开始按钮,选择程序,选择Wall Control项, 点击Wall Control软件进入大屏幕控制系统软件主界面如图9所示,整个软件分为3个区,标题区,设置区,功能区

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The way的用法及其含义(一) 有这样一个句子:In 1770 the room was completed the way she wanted. 1770年,这间琥珀屋按照她的要求完成了。 the way在句中的语法作用是什么?其意义如何?在阅读时,学生经常会碰到一些含有the way 的句子,如:No one knows the way he invented the machine. He did not do the experiment the way his teacher told him.等等。他们对the way 的用法和含义比较模糊。在这几个句子中,the way之后的部分都是定语从句。第一句的意思是,“没人知道他是怎样发明这台机器的。”the way的意思相当于how;第二句的意思是,“他没有按照老师说的那样做实验。”the way 的意思相当于as。在In 1770 the room was completed the way she wanted.这句话中,the way也是as的含义。随着现代英语的发展,the way的用法已越来越普遍了。下面,我们从the way的语法作用和意义等方面做一考查和分析: 一、the way作先行词,后接定语从句 以下3种表达都是正确的。例如:“我喜欢她笑的样子。” 1. the way+ in which +从句 I like the way in which she smiles. 2. the way+ that +从句 I like the way that she smiles. 3. the way + 从句(省略了in which或that) I like the way she smiles. 又如:“火灾如何发生的,有好几种说法。” 1. There were several theories about the way in which the fire started. 2. There were several theories about the way that the fire started.

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