Oxidizing Gas Flow Meter Precursor Solution HPLC Pump Inline Filter
Nanomiser Device Flame Substrate
sphere for the deposition of oxides and some non-oxide materials without the need of a sophisticated reactor and/ or expensive vacuum system.Since the precursor chemicals are directed to the substrate under an electric field which minimizes the loss of precursors to the surroundings,the deposition efficiency of ESA VD is significantly improved. In addition,ESA VD can offer flexible control of stoichiom-etry of the deposited films.[1,36,56]Simple oxides(e.g.,TiO,ESA VD.EAAJD allows the use of a wider cursor chemicals(both aqueous and nonaqueous systems),as well as providing a higher deposition and deposition rate.[36]
The use of EAAJD to synthesize II–VI
thin films and powders has been reported.
II–VI semiconducting films such as CdS,
were also obtained using EAAJD in an
Fig.3.A schematic diagram of the ESA VD process.Adapted from[36],with permission.Copyright2002,Imperial College Press.
Fig.4.Microscopic features of SnO2tubes synthesized at1150°C.a)Cross-section view;b)a single SnO2tube with partially opened top end;c)a SnO2 tube with fully open top end;d)SnO2tubes with open tip.Reprinted from [47],with permission.
temperature.The growth of the tubules is based on a self-catalyzed,direct vapor–solid mechanism,where the growth is achieved via the incorporation of new materials into the bottom of the existing tubules through surface diffusion. These well-aligned tubule arrays with adjustable tube size have potential applications in the fabrication of functional nanodevices,especially in energy storage and conversion.
7.Conclusions and Outlook
AACVD-based processes have attracted increasing inter-est and have been widely used to synthesize various CVD products.The substantial improvement in the delivery of the precursor via aerosol methods,enables AACVD-based processes to provide a greater capability and flexibility than